公开(公告)号：WO2017030990A1

公开(公告)日：2017-02-23

申请号：PCT/US2016/046865

申请日：2016-08-12

Applicant: KLA-TENCOR CORPORATION

Inventor： LEE, Myungjun ,  SMITH, Mark D. ,  KAPASI, Sanjay ,  PANDEV, Stillian ,  SANKO, Dimitry ,  SUBRAHMANYAN, Pradeep ,  LEVY, Ady

IPC: G03F7/20 ,  G03F7/00 ,  H01L21/027 ,  H01L21/66

CPC classification number: G03F7/70558 ,  G03F7/70091 ,  G03F7/70641

Abstract: A lithography system includes an illumination source and a set of projection optics. The illumination source directs a beam of illumination from an off-axis illumination pole to a pattern mask. The pattern mask includes a set of pattern elements to generate a set of diffracted beams including illumination from the illumination pole. At least two diffracted beams of the set of diffracted beams received by the set of projection optics are asymmetrically distributed in a pupil plane of the set of projection optics. The at least two diffracted beams of the set of diffracted beams are asymmetrically incident on the sample to form a set of fabricated elements corresponding to an image of the set of pattern elements. The set of fabricated elements on the sample includes one or more indicators of a location of the sample along an optical axis of the set of projection optics.

Abstract translation: 光刻系统包括照明源和一组投影光学器件。 照明源将来自离轴照明杆的照明光束引导到图案掩模。 图案掩模包括一组图案元件，以生成包括来自照明杆的照明的衍射光束集合。 该组投影光学器件所接收的衍射光束组中的至少两个衍射光束不对称地分布在该组投影光学器件的光瞳平面内。 衍射光束组中的至少两个衍射光束不对称地入射到样品上，以形成一组对应于该组图案元件的图像的制造元件。 样品上的一组制造元件包括样品沿着该组投影光学器件的光轴的位置的一个或多个指示器。

公开(公告)号：WO2017031014A1

公开(公告)日：2017-02-23

申请号：PCT/US2016/046939

申请日：2016-08-13

Applicant: KLA-TENCOR CORPORATION

Inventor： PANDEV, Stilian ,  SANKO, Dimitry

IPC: G01N21/95 ,  G01N35/00 ,  G06F17/50

CPC classification number: G01B21/042 ,  G01B2210/56

Abstract: A system, method and computer program product are provided for calibrating metrology tools. One or more design-of-experiments wafers is received for calibrating a metrology tool. A set of signals is collected by measuring the one or more wafers utilizing the metrology tool. A first transformation is determined to convert the set of signals to components, and a second transformation is determined to convert a set of reference signals to reference components. The set of reference signals is collected by measuring the one or more wafers utilizing a well-calibrated reference tool. A model is trained based on the reference components that maps the components to converted components, and the model, first transformation, and second transformation are stored in a memory associated with the metrology tool.

Abstract translation: 提供了一种用于校准计量工具的系统，方法和计算机程序产品。 接收一个或多个实验设计的晶片来校准测量工具。 通过使用计量工具测量一个或多个晶片来收集一组信号。 确定第一变换以将该组信号转换成分量，并且确定第二变换以将一组参考信号转换为参考分量。 通过使用精确校准的参考工具测量一个或多个晶片来收集参考信号组。 基于将组件映射到转换的组件的参考组件来训练模型，并且模型，第一变换和第二变换被存储在与计量工具相关联的存储器中。