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公开(公告)号：WO2018128641A1
公开(公告)日：2018-07-12
申请号：PCT/US2017/019713
申请日：2017-02-27
Applicant: KLA-TENCOR CORPORATION
Inventor： LEVINSKI, Vladimir , MANASSEN, Amnon , AMIR, Eran , AMIR, Nuriel , YERUSHALMI, Liran , SHAKED, Amit
Abstract: Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets. Supplementary structure(s) may be introduced in the target to interact optically with the bottom layer and/or with the top layer of the target and target cells configurations enable deriving measurements of device-characteristic features. For example, supplementary structure(s) may be designed to yield Moiré patterns with one or both layers, and metrology parameters may be derived from these patterns. Device production processes were adapted to enable production of corresponding targets, which may be measured by standard or by provided modified optical systems, configured to enable phase measurements of the Moiré patterns.
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公开(公告)号：WO2015157464A1
公开(公告)日：2015-10-15
申请号：PCT/US2015/024999
申请日：2015-04-08
Applicant: KLA-TENCOR CORPORATION
Inventor： MARCIANO, Tal , AMIT, Eran , BRINGOLTZ, Barak , AMIR, Nuriel , SHAKED, Amit
CPC classification number: G03F7/70633
Abstract: Metrology methods and targets are provided, for estimating inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments (each designed misalignment is between at least two overlapping periodic structures in the respective target cell). Inaccuracies which are related to the designed misalignments are reduced, process variation sources are detected and targets and measurement algorithms are optimized according to the derived dependency.
Abstract translation: 提供了计量方法和目标，用于通过从具有不同设计的不对准的至少三个目标单元的重叠测量推导出测量的不准确度对所设计的不对准的依赖性（每个设计的未对准在至少两个 各个靶细胞中重叠的周期性结构）。 与设计的不对准相关的不准确被减少，检测到过程变化源，并根据派生的依赖性优化目标和测量算法。
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