METHODS AND APPARATUS FOR VOID CHARACTERIZATION
    1.
    发明申请
    METHODS AND APPARATUS FOR VOID CHARACTERIZATION 审中-公开
    用于无效表征的方法和装置

    公开(公告)号:WO2003029799A1

    公开(公告)日:2003-04-10

    申请号:PCT/US2002/031518

    申请日:2002-10-01

    CPC classification number: G01N23/20

    Abstract: The present invention provides a system for characterizing voids (411) in test samples. An X-ray emission inducer scans a target such as a via on a test sample. A metallization (409) or thin film layer (405) emits X-rays as a result of the scan. The X-ray emission intensity can be measured and compared against a control measurement. The information obtained can be used to characterize a void in the scan target.

    Abstract translation: 本发明提供一种用于表征测试样品中的空隙(411)的系统。 X射线发射诱导器在测试样品上扫描诸如通孔的靶。 作为扫描的结果,金属化(409)或薄膜层(405)发射X射线。 可以测量X射线发射强度并与对照测量进行比较。 获得的信息可用于表征扫描目标中的空白。

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