公开(公告)号：JP2002080528A

公开(公告)日：2002-03-19

申请号：JP2001174608

申请日：2001-06-08

Applicant: KODAK POLYCHROME GRAPHICS CO

Inventor： GANDINI ALESSANDRO ,  WAIG FANG SANDRINE ,  TIMPE HANS-JOACHIM ,  BAUMANN HARALD

IPC: B41N1/08 ,  B41N3/03 ,  B41N3/04 ,  C08F8/00 ,  C08F8/28 ,  C08F216/06 ,  C08F216/38 ,  C08F218/02 ,  C08L29/14 ,  C08L79/00 ,  G03F7/00 ,  G03F7/021 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To obtain a polyvinyl acetal copolymer having high photosensitivity, excellent in adhesiveness to an aluminum substrate, having high print-continuing stability, and further capable of giving such a photosensitive composition that has satisfied quality by using the least possible components (it is preferable from an economical viewpoint) and exhibits the same or partially improved performance in comparison with other compositions known in the current technical level, when the copolymer is used for the photosensitive composition. SOLUTION: This polyvinyl acetal copolymer is obtained by reacting at least two kinds of aldehydes at the same time with a polyvinyl alcohol having a number average molecular weight of 20,000-150,000 g/mol.