CARBOXYLIC ACID COPOLYMER-BASED RADIATION SENSITIVE POSITIVE COATING COMPOSITION

    公开(公告)号:JP2003107692A

    公开(公告)日:2003-04-09

    申请号:JP2002204884

    申请日:2002-07-12

    Abstract: PROBLEM TO BE SOLVED: To provide a coating composition to manufacture a lithographic printing plate showing high print durability and stability. SOLUTION: The coating composition is a radiation sensitive composition containing (a) at least one kind of quinone diazide compound and (b) at least one kind of copolymer containing units A, B, C and D. The units A, B, C are expressed by formulae (A), (B) and (C), respectively and the unit D is a unit having at least one free carboxyl group. In the formulae, R represents a hydrogen atom or a 1-4C alkyl group and R1 represents a 1-4C alkyl group.

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