公开(公告)号：KR100756224B1

公开(公告)日：2007-09-06

申请号：KR20060056382

申请日：2006-06-22

Applicant: KOREA ELECTRONICS TECHNOLOGY

Inventor： KIM BONG SEOK ,  MOON CHAN WOO ,  CHUNG JUNG KEE ,  LEE JONG BAE ,  CHOI JUN HYUK ,  SUNG HA GYEONG

IPC: H02N2/10

CPC classification number: H02N2/123 ,  H01L41/053 ,  H02N2/005

Abstract: A rotary actuating device having a unit for compensating a friction force is provided to control actuating force to rotate a rotary plate by increasing or decreasing an amount of the friction force of each micro moving unit for the rotary plate. A rotary actuating device having a unit for compensating a friction force includes a base(100), a rotary plate(110), a plurality of micro moving units(120), a variable supporting unit(130), and a supporting plate(131). The base(100) is a plate type, supports other components, and forms a lower part of the rotary actuating device. The rotary plate(110) is rotatably installed on an upper part of the base(100). The plurality of micro moving units(120) are installed on a lower plane of the rotary plate(110). The variable supporting unit(130) supports the plurality of micro moving units(120) and controls for each micro moving unit to have uniform friction force for the rotary plate(110). The supporting plate(131) has an upper plane where the plurality of micro moving units(120) are installed and includes through holes(131a) upward and downward on at least three points thereof.

Abstract translation: 提供具有用于补偿摩擦力的单元的旋转致动装置，以通过增加或减少用于旋转板的每个微移动单元的摩擦力的量来控制致动力来旋转旋转板。 具有用于补偿摩擦力的单元的旋转致动装置包括基座（100），旋转板（110），多个微动单元（120），可变支撑单元（130）和支撑板 ）。 基座（100）是板式的，支撑其它部件，并形成旋转驱动装置的下部。 旋转板（110）可旋转地安装在基座（100）的上部。 多个微动单元（120）安装在旋转板（110）的下平面上。 可变支撑单元（130）支撑多个微动移动单元（120），并且每个微移动单元的控制对旋转板（110）具有均匀的摩擦力。 支撑板（131）具有安装有多个微动单元（120）的上平面，并且在其至少三个点上具有向上和向下的通孔（131a）。