公开(公告)号：KR100762204B1

公开(公告)日：2007-10-02

申请号：KR20060037000

申请日：2006-04-25

Applicant: KOREA ELECTRONICS TECHNOLOGY

Inventor： KIM MYOUNG JIN ,  KIM HWE KYUNG

IPC: G02B5/20

CPC classification number: G02B5/281

Abstract: A method for fabricating an optical multi-layer thin film is provided to implement multi-band transmission filter having a wanted transmission band by precisely controlling the thickness of a Non-QWOT(Quater Wave Optical Thickness) stack layer through a QWOT stack structure layer and a thin film thickness control layer. A method for fabricating an optical multi-layer thin film includes the steps of: forming a QWOT stack structure layer in which material layers of different refractive indexes are alternatively stacked on a substrate in the thickness of QWOT(S11); forming a Non-QWOT stack structure layer in which material layers of different refractive indexes are alternatively stacked in the thickness of Non-QWOT on the QWOT stack structure layer(S12); forming a thin film thickness control layer having the thickness of an integer multiple which is larger than two times of the QWOT(S13); and forming the Non-QWOT stack structure layer on the upper part of the thin film thickness control layer(S14).

Abstract translation: 提供一种制造光学多层薄膜的方法，通过QWOT堆叠结构层精确控制非QWOT（四波形光学厚度）层叠层的厚度来实现具有期望的传输带的多频带传输滤波器， 薄膜厚度控制层。 一种制造光学多层薄膜的方法包括以下步骤：形成QWOT层叠结构层，其中不同折射率的材料层以QWOT的厚度交替堆叠在基板上（S11）; 形成非QWOT堆叠结构层，其中不同折射率的材料层交替地堆叠在QWOT堆叠结构层上的非QWOT的厚度上（S12）; 形成厚度大于QWOT的两倍的整数倍的薄膜厚度控制层（S13）; 并在薄膜厚度控制层的上部形成非QWOT叠层结构层（S14）。