公开(公告)号：JPH08227931A

公开(公告)日：1996-09-03

申请号：JP31680395

申请日：1995-12-05

Applicant: KOREA ELECTRONICS TELECOMM

Inventor： RI SHIYOUHIYUN ,  YU KEISHIYUN ,  SAI FUEN ,  CHIYOU GENYOKU ,  CHIYOU KIKOU

IPC: B65G49/07 ,  B25J15/08 ,  H01L21/677 ,  H01L21/68 ,  H01L21/687

Abstract: PROBLEM TO BE SOLVED: To eliminate gas leaks between a reactor and tripod by providing a means for gripping the side face of a wafer, wafer carrier including means for detecting the malfunction thereof, and vacuum reactor having a vacuum exhaust hole at the bottom of a wafer chuck. SOLUTION: A gripper of a wafer carrier has a forefinger 110 for holding the side face of a wafer and wafer contacting ends at the tops of both its sides or center end support 102. A support table 100 has an optical sensor 160 for detecting the existence of the light shut-off by an operating lever 113 of the forefinger 110 at a detector of the wafer carrier, thereby detecting the malfunction at operating of the gripper. A tripod at the bottom of a wafer chuck and drive unit are removed, to allow a vacuum exhaust hole and vacuum pump to be located at the bottom of the chuck. This maintains the axial symmetry of a process gas flow which is fed from an upper gas feeder to enhance the process uniformity.