公开(公告)号：WO2015102240A1

公开(公告)日：2015-07-09

申请号：PCT/KR2014/011729

申请日：2014-12-02

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： MOON, Myoung Woon ,  LEE, Heon Ju ,  LEE, Jeong Sim ,  KO, Tae Jun ,  OH, Kyu Hwan ,  KIM, Do Hyun ,  YU, Eu Sun

IPC: C03C17/34 ,  C09K3/18 ,  C03C4/00

CPC classification number: C03C17/42 ,  B81C1/00031 ,  B81C1/00111 ,  B81C2201/0132 ,  C03C15/00 ,  C03C2217/76 ,  C03C2218/153 ,  C03C2218/328 ,  C03C2218/33

Abstract: The present invention relates to a glass having a surface with improved water-repellency or hydrophobicity and low reflectance, and a fabrication method thereof. A technology is employed, in which a thin film containing silicon or silicon oxide is formed on the glass surface, the nano-structures are formed by selective etching treatment using a reactive gas such as CF 4 or the like to provide superhydrophobicity and low reflectance properties, and a material with low surface energy is coated onto the nano-structures. The fabrication method of the low-reflective and superhydrophobic or super water-repellent glass may execute deposition and etching processes for the glass having the superhydrophobicity and the low reflectance, and provide excellent superhydrophobicity and low reflectance to the surface of the glass which was difficult to be treated. Also, the method is sustainable due to non-use of a toxic etching solution during these processes. The superhydrophobic and low-reflective glass can be applied to various fields, such as high-tech smart devices, vehicles, home appliances and so forth.

Abstract translation: 本发明涉及具有改善的疏水性或疏水性和低反射率的表面的玻璃及其制造方法。 采用在玻璃表面上形成含有硅或氧化硅的薄膜的技术，通过使用CF 4等的反应性气体的选择性蚀刻处理形成纳米结构体，提供超疏水性和低反射性， 并且具有低表面能的材料被涂覆到纳米结构上。 低反射和超疏水或超疏水玻璃的制造方法可以对具有超疏水性和低反射率的玻璃进行沉积和蚀刻工艺，并且对玻璃表面提供优异的超疏水性和低反射率，这是难以 被处理。 此外，由于在这些过程中不使用有毒蚀刻溶液，该方法是可持续的。 超疏水性低反射玻璃可以应用于高科技智能装置，车辆，家用电器等各种领域。