公开(公告)号：US20210404797A1

公开(公告)日：2021-12-30

申请号：US16651792

申请日：2019-07-29

Applicant: Korea Research Institute of Standards and Science

Inventor： Young-Sik GHIM ,  The Manh NGUYEN ,  Hyug-Gyo RHEE

IPC: G01B11/25

Abstract: The present disclosure is related to a system and a method for 3D shape measurement of a freeform surface based on high-speed deflectometry using composite patterns. More particularly, a system for profile measurement based on high-speed deflectometry using composite patterns includes: a composite pattern generation part to project a composite pattern generated by synthesizing patterns having different frequencies to a measurement object; a detector to acquire images of a deformed composite pattern reflected from the measurement object; and a phase acquisition part to acquire wrapped phases by each frequency from the composite pattern and unwrapped phases from the respective wrapped phases.

公开(公告)号：US20190101373A1

公开(公告)日：2019-04-04

申请号：US15538846

申请日：2016-08-26

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Young-Sik GHIM ,  Hyug-Gyo RHEE ,  Yun Woo LEE

IPC: G01B9/02 ,  G01B11/06 ,  G06F17/16 ,  G06F17/17

CPC classification number: G01B9/02041 ,  G01B9/02015 ,  G01B9/02062 ,  G01B11/0625 ,  G01B11/0675 ,  G01B11/2441 ,  G06F17/16 ,  G06F17/17

Abstract: The present disclosure relates to an apparatus for measuring a thickness and a surface profile of a multilayered film structure using an imaging spectral optical system and a measuring method. More specifically, the present disclosure relates to a method and an apparatus which measure a thickness and a surface profile of a multilayered thin film structure by applying a method for obtaining an absolute reflectance value for an object to be measured having a multilayered thin film using a reflected light measuring method and extracting a phase from an interference signal with a reference mirror using a phase shift algorithm.

公开(公告)号：US20150146213A1

公开(公告)日：2015-05-28

申请号：US14318003

申请日：2014-06-27

Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE

Inventor： Hyug-Gyo RHEE ,  Young Sik GHIM ,  Ho Soon YANG ,  Yun Woo LEE

IPC: G01J9/02

CPC classification number: G01J9/0215 ,  G01J2009/002

Abstract: Provided is an operating method of a measuring apparatus measuring a wavefront of a target. The operating method includes measuring a measurement wavefront on the basis of the wavefront of the target, measuring reference slope information and first to third slope information respectively corresponding to a reference direction and first to third directions on the basis of the measurement wavefront, obtaining first to third rotation angles on the basis of the measured reference slope information and first to third slope information, and outputting a wavefront of which an error is corrected, which is generated by rotation errors on the basis of the obtained first to third rotation angles, wherein the first to third rotation angles are differences in angle between the reference direction and the first to third directions.

Abstract translation: 提供了测量目标的波前的测量装置的操作方法。 操作方法包括基于目标的波阵面测量测量波阵面，基于测量波阵面测量分别对应于参考方向和第一至第三方向的参考斜率信息和第一至第三斜率信息，首先获得 基于所测量的基准斜率信息和第一至第三斜率信息的第三旋转角度，并且基于获得的第一至第三旋转角度输出由旋转误差产生的误差校正的波阵面，其中， 第一至第三旋转角度是参考方向和第一至第三方向之间的角度差。