公开(公告)号：JP2000091991A

公开(公告)日：2000-03-31

申请号：JP24901199

申请日：1999-09-02

Applicant: KOREA TELECOMMUN ,  DAEWOO TELECOMMUN LTD

Inventor： TEI KITAI ,  RI EITAKU ,  TEI KOCHIN ,  JO KANKYO ,  ZEN SEIYU ,  BOKU TAISO ,  KO SEKIHO ,  JO INKI ,  SAI SEINICHI ,  BOKU SOUKU

IPC: H04B10/2507 ,  G01N21/78 ,  G02B6/02 ,  G02B6/34 ,  H04B10/2525 ,  H04B10/02 ,  G02B6/10 ,  H04B10/18

Abstract: PROBLEM TO BE SOLVED: To provide a dispersion compensation device that can effectively compensate a dispersion value and a dispersion slope of a single mode optical fiber at the same time. SOLUTION: The dispersion compensation device 40 is used for an optical transmission system having a single mode optical fiber to compensate a dispersion value and a dispersion slope of the single mode optical fiber at the same time and provided with a dispersion compensation optical fiber where two optical fiber components DCF or over whose dispersion value Di per unit length and whose dispersion slope Si per unit length differ from each other are connected in series.

公开(公告)号：JP2000147308A

公开(公告)日：2000-05-26

申请号：JP31541199

申请日：1999-11-05

Applicant: KOREA TELECOMMUN

Inventor： BOKU JUSHIN ,  TEI KITAI ,  JO DAISHAKU ,  SAI EIFUKU ,  KAN SOHITSU

IPC: G02B6/30 ,  G02B6/24 ,  G02B6/42

Abstract: PROBLEM TO BE SOLVED: To provide an easy method for passive alignment of optical elements by alignment marks. SOLUTION: The remaining portions excluding the V-groove forming regions of a silicon substrate 90 are etched to a specified thickness. A planatarized mask material film 98 is formed on the silicon substrate 90. Mask patterns for etching the V-grooves are formed by etching back the mask material film 98 in such a manner that the silicon substrate 90 is exposed. The silicon substrate 90 exposed to the extent of exposing the side walls of the mask patterns is etched. The silicon substrate 90 exposing the mask patterns by etching barriers is subjected to wet process etching, by which the V-groove are formed.