REFERENCE DATA GENERATING METHOD FOR SUBSTRATE INSPECTION
    1.
    发明公开
    REFERENCE DATA GENERATING METHOD FOR SUBSTRATE INSPECTION 审中-公开
    REFERENZDATEN-ERZEUGUNGSVERFAHREN ZURSUBSTRATÜBERPRÜFUNG

    公开(公告)号:EP3046405A1

    公开(公告)日:2016-07-20

    申请号:EP14844433.4

    申请日:2014-09-11

    Abstract: The present invention relates to a method of generating reference data for inspecting a circuit board. The method comprises steps of scanning a bare circuit board to obtain image information of the bare circuit board, generating a compensation matrix using pad coordinate information extracted from the image information and pad coordinate information prestored in design data, and generating, by applying the compensation matrix to the image information, a reference data including coordinate information of a distinctive object. According to the method, inspection efficiency may optimized through quickly generating reference data without CAD information necessary for circuit board inspection.

    Abstract translation: 本发明涉及一种生成用于检查电路板的参考数据的方法。 该方法包括以下步骤:扫描裸电路板以获得裸电路板的图像信息,使用从图像信息提取的焊盘坐标信息和在设计数据中预先存储的焊盘坐标信息产生补偿矩阵,并通过应用补偿矩阵 涉及图像信息,包括特征对象的坐标信息的参考数据。 根据该方法,通过快速生成参考数据,无需电路板检查所需的CAD信息,可以优化检测效率。

    METHOD FOR GENERATING COMPENSATION MATRIX DURING SUBSTRATE INSPECTION
    2.
    发明授权
    METHOD FOR GENERATING COMPENSATION MATRIX DURING SUBSTRATE INSPECTION 有权
    在衬底检测期间产生补偿矩阵的方法

    公开(公告)号:EP3046406B1

    公开(公告)日:2018-02-21

    申请号:EP14844693.3

    申请日:2014-09-11

    Abstract: The present invention relates to a method for generating a compensation matrix during a substrate inspection. The method comprises the steps of: selecting information of N1 (N1 ‰§2) feature objects which are randomly predetermined within a field of view (FOV) on a substrate; generating a first compensation matrix on the basis of information of the feature objects which are extracted on the substrate; comparing an offset value of each of all the feature objects with a predetermined reference value by applying all the feature objects within the FOV to the compensation matrix to count the number of the feature objects of which the offset value of the each of all the feature objects is less than the predetermined reference value; and repeatedly performing the above steps N2 times (N2‰§1), and generating a second compensation matrix using information of the feature objects which have the offset value which is less than the predetermined reference value, in case the number of the counted feature objects is the maximum.

    METHOD FOR GENERATING COMPENSATION MATRIX DURING SUBSTRATE INSPECTION
    4.
    发明公开
    METHOD FOR GENERATING COMPENSATION MATRIX DURING SUBSTRATE INSPECTION 有权
    VERFAHREN ZUR ERZEUGUNG EINER KOMPENSATIONSMATRIXWÄHRENDEINERSUBSTRATPRÜFUNG

    公开(公告)号:EP3046406A1

    公开(公告)日:2016-07-20

    申请号:EP14844693.3

    申请日:2014-09-11

    Abstract: The present invention relates to a method for generating a compensation matrix during a substrate inspection. The method comprises the steps of: selecting information of N1 (N1 ≧2) feature objects which are randomly predetermined within a field of view (FOV) on a substrate; generating a first compensation matrix on the basis of information of the feature objects which are extracted on the substrate; comparing an offset value of each of all the feature objects with a predetermined reference value by applying all the feature objects within the FOV to the compensation matrix to count the number of the feature objects of which the offset value of the each of all the feature objects is less than the predetermined reference value; and repeatedly performing the above steps N2 times (N2≧1), and generating a second compensation matrix using information of the feature objects which have the offset value which is less than the predetermined reference value, in case the number of the counted feature objects is the maximum.

    Abstract translation: 本发明涉及在衬底检查期间产生补偿矩阵的方法。 该方法包括以下步骤:在衬底上选择在视场(FOV)内随机预定的N1(N1‰§2)特征对象的信息; 基于在所述基板上提取的所述特征对象的信息生成第一补偿矩阵; 通过将FOV内的所有特征对象应用于补偿矩阵来对所有特征对象中的每一个的偏移值与预定的参考值进行比较,以对所有特征对象中的每一个的偏移值进行计数的特征对象的数量 小于预定参考值; 并重复执行上述步骤N2次(N2‰§1),并且使用具有小于预定参考值的偏移值的特征对象的信息生成第二补偿矩阵,在计数特征对象的数量 是最大值。

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