公开(公告)号：EP3828148A1

公开(公告)日：2021-06-02

申请号：EP20203055.7

申请日：2020-10-21

Applicant: Korea Institute of Science and Technology

Inventor： MOON, Myoung Woon ,  YOON, Sun Mi ,  LEE, Young A

IPC: C03C17/245

Abstract: The present invention relates to: a method of manufacturing glass with hollow nanopillars, which includes a silicon oxide layer forming step in which a silicon oxide layer made of silicon oxide is formed on one side of a glass substrate, a first etching step in which the silicon oxide layer is etched and a plurality of silicon oxide clusters are formed on the glass substrate, and a second etching step in which the glass substrate, on which the silicon oxide clusters are formed, is etched and hollow nanopillars are formed; and glass with hollow nanopillars manufactured thereby.