公开(公告)号：WO9934399B1

公开(公告)日：1999-08-26

申请号：PCT/US9827885

申请日：1998-12-31

Applicant: LAM RES CORP

Inventor： BALDWIN SCOTT K JR ,  BARNES MICHAEL S ,  HOLLAND JOHN P

IPC: H05H1/46 ,  C23C14/34 ,  H01J37/32

CPC classification number: H01J37/32477 ,  H01J37/32009 ,  H01J37/321 ,  H01J37/34

Abstract: A plasma processor for a workpiece includes a coil for supplying an r.f. exciting field through a window to a plasma in a vacuum chamber. A powered non-magnetic metal member between the coil and plasma couples the field to the plasma. In first and second embodiments, the metal member is respectively (1) a plate abutting a face of the window inside the chamber and (2) a thin film on an interior face of the window. In a third embodiment, the plate and film are both used. All embodiments help to ignite the plasma. The second embodiment increases plasma stability and prevents window clouding by ionized plasma particles. Metal from the plate is sputtered as a deposit onto the workpiece. The third embodiment enables substantially simultaneous depositing and cleaning.

Abstract translation: 一种用于工件的等离子体处理器包括用于供应r.f的线圈。 激光场通过窗口到真空室中的等离子体。 线圈和等离子体之间的动力非磁性金属构件将场耦合到等离子体。 在第一和第二实施例中，金属构件分别是（1）邻接室内的窗的表面的板和（2）在窗的内表面上的薄膜。 在第三实施例中，使用板和膜。 所有实施例都有助于点燃等离子体。 第二实施例增加等离子体稳定性并防止电离等离子体颗粒的窗玻璃化。 从板上的金属溅镀成沉积物。 第三实施例能够基本上同时进行存放和清洁。

公开(公告)号：AU2210299A

公开(公告)日：1999-07-19

申请号：AU2210299

申请日：1998-12-31

Applicant: LAM RES CORP

Inventor： BALDWIN SCOTT K JR ,  BARNES MICHAEL S ,  HOLLAND JOHN P

IPC: H05H1/46 ,  C23C14/34 ,  H01J37/32

Abstract: A plasma processor for a workpiece includes a coil for supplying an r.f. exciting field through a window to a plasma in a vacuum chamber. A powered non-magnetic metal member between the coil and plasma couples the field to the plasma. In first and second embodiments, the metal member is respectively (1) a plate abutting a face of the window inside the chamber and (2) a thin film on an interior face of the window. In a third embodiment, the plate and film are both used. All embodiments help to ignite the plasma. The second embodiment increases plasma stability and prevents window clouding by ionized plasma particles. Metal from the plate is sputtered as a deposit onto the workpiece. The third embodiment enables substantially simultaneous depositing and cleaning.

公开(公告)号：AT240585T

公开(公告)日：2003-05-15

申请号：AT98966132

申请日：1998-12-31

Applicant: LAM RES CORP

Inventor： BALDWIN SCOTT K JR ,  BARNES MICHAEL S ,  HOLLAND JOHN P

IPC: H05H1/46 ,  C23C14/34 ,  H01J37/32

Abstract: A plasma processor for a workpiece includes a coil for supplying an r.f. exciting field through a window to a plasma in a vacuum chamber. A powered non-magnetic metal member between the coil and plasma couples the field to the plasma. In first and second embodiments, the metal member is respectively (1) a plate abutting a face of the window inside the chamber and (2) a thin film on an interior face of the window. In a third embodiment, the plate and film are both used. All embodiments help to ignite the plasma. The second embodiment increases plasma stability and prevents window clouding by ionized plasma particles. Metal from the plate is sputtered as a deposit onto the workpiece. The third embodiment enables substantially simultaneous depositing and cleaning.