公开(公告)号：DE69631258D1

公开(公告)日：2004-02-05

申请号：DE69631258

申请日：1996-10-11

Applicant: LAM RES CORP

Inventor： DELARIOS JOHN M ,  GARDNER G ,  RAVKIN MIKHAIL

IPC: A46B11/06 ,  B08B1/04 ,  B08B3/08 ,  H01L21/00 ,  H01L21/306 ,  H01L21/311

Abstract: In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used.

公开(公告)号：DE69620037T2

公开(公告)日：2002-11-07

申请号：DE69620037

申请日：1996-10-11

Applicant: LAM RES CORP

Inventor： DELARIOS M ,  RAVKIN MIKHAIL ,  GARDNER G

IPC: A46B11/06 ,  B08B1/04 ,  B08B3/08 ,  H01L21/00 ,  H01L21/306 ,  H01L21/311 ,  B08B1/00 ,  C23G1/00 ,  C23G1/02 ,  C23G1/14 ,  A46B11/00 ,  A46B13/00

Abstract: In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used.

公开(公告)号：DE69620037D1

公开(公告)日：2002-04-25

申请号：DE69620037

申请日：1996-10-11

Applicant: LAM RES CORP

Inventor： DELARIOS M ,  RAVKIN MIKHAIL ,  GARDNER G

IPC: A46B11/06 ,  B08B1/04 ,  B08B3/08 ,  H01L21/00 ,  H01L21/306 ,  H01L21/311 ,  B08B1/00 ,  C23G1/00 ,  C23G1/02 ,  C23G1/14 ,  A46B11/00 ,  A46B13/00

Abstract: In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used.

公开(公告)号：DE69631258T2

公开(公告)日：2004-11-18

申请号：DE69631258

申请日：1996-10-11

Applicant: LAM RES CORP

Inventor： DELARIOS JOHN M ,  GARDNER G ,  RAVKIN MIKHAIL

IPC: A46B11/06 ,  B08B1/04 ,  B08B3/08 ,  H01L21/00 ,  H01L21/306 ,  H01L21/311

Abstract: In a method of cleaning a substrate, a solution is applied to the substrate through a brush which also scrubs the substrate. Alternatively, (i) the substrate is scrubbed with a brush, an HF soln. is applied to the substrate and the brush is rinsed; or (ii) the substrate is placed in a scrubber, a first scrubbing cycle is carried out at a first station where a first soln . is applied to the substrate through the brush, a second scrubbing cycle is carried out at a second station using a second soln. and second brush and the brush is rinsed. Also claimed is an appts. for carrying out the process. Pref. a PVA brush is used.