公开(公告)号：EP0890050A4

公开(公告)日：1999-08-25

申请号：EP97917082

申请日：1997-03-27

Applicant: LAM RES CORP

Inventor： KAVEH FARRO F ,  BARNES MICHAEL S ,  RICHARDSON BRETT C ,  OLSON CHRISTOPHER H

IPC: H01L21/302 ,  B01J3/02 ,  F16K31/12 ,  F16K31/36 ,  G05D16/20 ,  H01L21/3065 ,  B05C11/00 ,  C23F1/02 ,  H01L21/00

CPC classification number: G05D16/202 ,  Y10S438/909 ,  Y10T137/0396 ,  Y10T137/2572 ,  Y10T137/7761

Abstract: A method and apparatus is disclosed for controlling the pressure of reaction chamber (106) in wafer processing equipment. The disclosed apparatus and method uses a ballast port (150a, 150b) for inserting gas into the evacuation system (130), thereby controlling the pressure in the reaction chamber (106). The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve (124) which is located between the reaction chamber (106) and turbo pump (126). The disclosed apparatus and method further introduces process gases at higher rate than set point levels to reduce the transition time or stabilization time required when raising the pressure in the reaction chamber (106).

Abstract translation: 公开了一种用于控制晶片处理设备中的反应室（106）的压力的方法和设备。 所公开的设备和方法使用用于将气体插入到抽空系统（130）中的压载口（150a，150b），从而控制反应室（106）中的压力。 所公开的装置和方法进一步使用估计曲线来估计位于反应室（106）和涡轮泵（126）之间的受控闸阀（124）的期望位置。 所公开的设备和方法还以比设定点水平更高的速率引入工艺气体，以减小当升高反应室（106）中的压力时所需的过渡时间或稳定时间。

公开(公告)号：DE69907890T2

公开(公告)日：2004-02-19

申请号：DE69907890

申请日：1999-03-30

Applicant: LAM RES CORP

Inventor： MCMILLIN K ,  KAVEH FARRO F ,  BARNES MICHAEL

IPC: G05D16/20

Abstract: A method and apparatus is disclosed for controlling the pressure of a reaction chamber (106) in wafer processing equipment. The disclosed apparatus and method uses a ballast port (150b) for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve (124) which is located between the reaction chamber and turbo pump (126). The disclosed apparatus and method achieves a set point pressure by prepositioning a throttle valve followed by repositioning the throttle valve based on the difference between a measure pressure and the set point pressure using proportional and integral control, wherein enablement of integral control is delayed for a pre-specified period.

公开(公告)号：DE69926551D1

公开(公告)日：2005-09-08

申请号：DE69926551

申请日：1999-03-30

Applicant: LAM RES CORP

Inventor： MCMILLAN BRIAN K ,  BARNES MICHAEL ,  KAVEH FARRO F

IPC: G05D16/20

Abstract: A method and apparatus is disclosed for controlling the pressure of a reaction chamber (106) in wafer processing equipment. The disclosed apparatus and method uses a ballast port (150b) for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve (124) which is located between the reaction chamber and turbo pump (126). The disclosed apparatus and method achieves a set point pressure by prepositioning a throttle valve followed by repositioning the throttle valve based on the difference between a measure pressure and the set point pressure using proportional and integral control, wherein enablement of integral control is delayed for a pre-specified period.

公开(公告)号：AT301303T

公开(公告)日：2005-08-15

申请号：AT02028407

申请日：1999-03-30

Applicant: LAM RES CORP

Inventor： MCMILLAN BRIAN K ,  BARNES MICHAEL ,  KAVEH FARRO F

IPC: G05D16/20

Abstract: A method and apparatus is disclosed for controlling the pressure of a reaction chamber (106) in wafer processing equipment. The disclosed apparatus and method uses a ballast port (150b) for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve (124) which is located between the reaction chamber and turbo pump (126). The disclosed apparatus and method achieves a set point pressure by prepositioning a throttle valve followed by repositioning the throttle valve based on the difference between a measure pressure and the set point pressure using proportional and integral control, wherein enablement of integral control is delayed for a pre-specified period.

公开(公告)号：ES2197633T3

公开(公告)日：2004-01-01

申请号：ES99915129

申请日：1999-03-30

Applicant: LAM RES CORP

Inventor： MCMILLIN BRIAN K ,  KAVEH FARRO F ,  BARNES MICHAEL

IPC: G05D16/20

Abstract: A method and apparatus is disclosed for controlling the pressure of a reaction chamber (106) in wafer processing equipment. The disclosed apparatus and method uses a ballast port (150b) for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve (124) which is located between the reaction chamber and turbo pump (126). The disclosed apparatus and method achieves a set point pressure by prepositioning a throttle valve followed by repositioning the throttle valve based on the difference between a measure pressure and the set point pressure using proportional and integral control, wherein enablement of integral control is delayed for a pre-specified period.

公开(公告)号：AT240544T

公开(公告)日：2003-05-15

申请号：AT99915129

申请日：1999-03-30

Applicant: LAM RES CORP

Inventor： MCMILLIN BRIAN K ,  KAVEH FARRO F ,  BARNES MICHAEL

IPC: G05D16/20

Abstract: A method and apparatus is disclosed for controlling the pressure of a reaction chamber (106) in wafer processing equipment. The disclosed apparatus and method uses a ballast port (150b) for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve (124) which is located between the reaction chamber and turbo pump (126). The disclosed apparatus and method achieves a set point pressure by prepositioning a throttle valve followed by repositioning the throttle valve based on the difference between a measure pressure and the set point pressure using proportional and integral control, wherein enablement of integral control is delayed for a pre-specified period.

公开(公告)号：DE69926551T2

公开(公告)日：2006-06-08

申请号：DE69926551

申请日：1999-03-30

Applicant: LAM RES CORP

Inventor： MCMILLAN BRIAN K ,  BARNES MICHAEL ,  KAVEH FARRO F

IPC: G05D16/20

Abstract: A method and apparatus is disclosed for controlling the pressure of a reaction chamber (106) in wafer processing equipment. The disclosed apparatus and method uses a ballast port (150b) for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve (124) which is located between the reaction chamber and turbo pump (126). The disclosed apparatus and method achieves a set point pressure by prepositioning a throttle valve followed by repositioning the throttle valve based on the difference between a measure pressure and the set point pressure using proportional and integral control, wherein enablement of integral control is delayed for a pre-specified period.

公开(公告)号：ES2242820T3

公开(公告)日：2005-11-16

申请号：ES02028407

申请日：1999-03-30

Applicant: LAM RES CORP

Inventor： MCMILLAN BRIAN K ,  BARNES MICHAEL ,  KAVEH FARRO F

IPC: G05D16/20

Abstract: Un método para controlar la presión en una cámara de procesado que ha sido sometida a evacuación (106), que comprende los pasos de: recuperar de la memoria electrónica un valor deseado de la presión que refleje un nivel de presión deseado para la cámara de procesado (106); recuperar de la memoria electrónica un valor deseado del flujo de gas que represente un caudal de gas deseado a través de la cámara de procesado (106); obtener acceso desde la memoria electrónica (190) a una función matemática que tiene un dominio que comprende las presiones en la cámara de procesado (106) y los caudales de flujo de gas al interior de la cámara de procesado (106), y que abarca un campo que comprende las posiciones de la válvula de estrangulación (124); medir la presión dentro de la cámara de procesado (106); calcular un error de la presión igual a la diferencia entre la presión deseada y la presión medida; y situar en posición la válvula de estrangulación (124) repitiendo para ello los pasos de: (a) recuperar de la memoria electrónica (190) las ganancias: proporciona, integral y derivada, en que al menos una de dichas ganancias no es igual a cero; (b) calcular una compensación proporcional de la posición de la válvula, una compensación integral de la posición de la válvula, y una compensación derivada de la posición de la válvula aplicando para ello el error de presión a la ganancia proporcional ala ganancia integral y a la ganancia derivada, respectivamente; (c) sumar las salidas del paso (b) para proporcionar un valor que representa un caudal de flujo volumétrico; (d) dividir el valor del caudal de flujo volumétrico por un valor de la presión para obtener un cociente que represente flujo/presión; (e) aplicar el cociente a la inversa de la función matemática a la que se obtuvo acceso desde la memoria electrónica (190) para proporcionar una nueva posición de la válvula; y (f) modificar la posición de la válvula para llevarla a la nueva posición de la válvula.

公开(公告)号：DE69907890D1

公开(公告)日：2003-06-18

申请号：DE69907890

申请日：1999-03-30

Applicant: LAM RES CORP

Inventor： MCMILLIN K ,  KAVEH FARRO F ,  BARNES MICHAEL

IPC: G05D16/20

Abstract: A method and apparatus is disclosed for controlling the pressure of a reaction chamber (106) in wafer processing equipment. The disclosed apparatus and method uses a ballast port (150b) for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve (124) which is located between the reaction chamber and turbo pump (126). The disclosed apparatus and method achieves a set point pressure by prepositioning a throttle valve followed by repositioning the throttle valve based on the difference between a measure pressure and the set point pressure using proportional and integral control, wherein enablement of integral control is delayed for a pre-specified period.