公开(公告)号：WO2011146108A3

公开(公告)日：2012-04-05

申请号：PCT/US2011000857

申请日：2011-05-13

Applicant: LAM RES CORP ,  BROWN DANNY ,  SHARPLESS LEONARD

Inventor： BROWN DANNY ,  SHARPLESS LEONARD

IPC: H01L21/3065

CPC classification number: H01L21/3065 ,  B23K20/122 ,  H01J37/32495 ,  H01J37/32623 ,  Y10T29/49117 ,  Y10T29/49826 ,  Y10T29/49888

Abstract: A movable symmetric chamber liner in a plasma reaction chamber, for protecting the plasma reaction chamber, enhancing the plasma density and uniformity, and reducing process gas consumption, comprising a cylindrical wall, a bottom wall with a plurality of openings, a raised inner rim with an embedded heater, heater contacts, and RF ground return contacts. The chamber liner is moved by actuators between an upper position at which substrates can be transferred into and out of the chamber, and a lower position at which substrate are processed in the chamber. The actuators also provide electrical connection to the heater and RF ground return contacts.

Abstract translation: 在等离子体反应室中的可移动的对称室衬套，用于保护等离子体反应室，增强等离子体密度和均匀性，并减少工艺气体消耗，包括圆柱形壁，具有多个开口的底壁， 嵌入式加热器，加热器触点和RF接地返回触点。 腔室衬垫由致动器在衬底可以被转移到腔室中的上部位置和在腔室中被处理衬底的下部位置之间移动。 致动器还提供与加热器和RF接地返回触点的电连接。

公开(公告)号：WO2011133207A3

公开(公告)日：2012-02-23

申请号：PCT/US2011000683

申请日：2011-04-15

Applicant: LAM RES CORP ,  KENWORTHY IAN ,  OUTKA DUANE ,  HAO FANGLI ,  SHARPLESS LEONARD ,  DU YIJUN

Inventor： KENWORTHY IAN ,  OUTKA DUANE ,  HAO FANGLI ,  SHARPLESS LEONARD ,  DU YIJUN

IPC: C23C16/50 ,  H01L21/205 ,  H05H1/46

CPC classification number: F17D5/005 ,  B05D1/30 ,  B05D7/222 ,  F17D1/04 ,  H01J37/3244 ,  H01J37/32495 ,  H01J2237/3341 ,  H01L21/67069 ,  Y10T137/8593

Abstract: A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.

Abstract translation: 涂覆等离子体处理系统例如等离子体蚀刻系统的气体输送系统的气体通道的内表面的方法包括（a）使耐腐蚀材料的流体前体流过气体通道并沉积一层 流体前体，以完全涂覆气体通道的内表面; （b）从内表面除去多余的流体前体; （c）固化流体前体的沉积层以形成耐腐蚀材料涂层。

公开(公告)号：SG185669A1

公开(公告)日：2012-12-28

申请号：SG2012085312

申请日：2011-05-13

Applicant: LAM RES CORP

Inventor： BROWN DANNY ,  SHARPLESS LEONARD

Abstract: A movable symmetric chamber liner in a plasma reaction chamber, for protecting the plasma reaction chamber, enhancing the plasma density and uniformity, and reducing process gas consumption, comprising a cylindrical wall, a bottom wall with a plurality of openings, a raised inner rim with an embedded heater, heater contacts, and RF ground return contacts. The chamber liner is moved by actuators between an upper position at which substrates can be transferred into and out of the chamber, and a lower position at which substrate are processed in the chamber. The actuators also provide electrical connection to the heater and RF ground return contacts.

公开(公告)号：SG184948A1

公开(公告)日：2012-11-29

申请号：SG2012077731

申请日：2011-04-15

Applicant: LAM RES CORP

Inventor： KENWORTHY IAN ,  OUTKA DUANE ,  HAO FANGLI ,  SHARPLESS LEONARD ,  DU YIJUN

Abstract: A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.

公开(公告)号：SG10201503199PA

公开(公告)日：2015-06-29

申请号：SG10201503199P

申请日：2011-04-15

Applicant: LAM RES CORP

Inventor： KENWORTHY IAN ,  OUTKA DUANE ,  HAO FANGLI ,  SHARPLESS LEONARD ,  DU YIJUN

Abstract: A gas delivery system for a plasma process system such as a plasma etching system wherein inner surfaces of gas passages are coated with a corrosion-resistant material coating formed by curing a layer of fluidic precursor deposited on the inner surfaces. The coating can be formed by (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.