Abstract:
A resist composition is provided to stably separate a mold and extend the lifetime of the mold and to improve adhesion of a base layer and a resist pattern in an imprinting lithography process. A resist composition includes UV(ultraviolet) curable resin and an additive, containing an adhesion increasing agent for inducing a chemical combination of the UV curable resin and a coated layer. The adhesion increasing agent can be one of an epoxy-based compound or a urethane-based compound. The additive can include at least one of an initiator and a coupling agent.
Abstract:
A soft mold resist for soft-lithography and a method for fabricating a liquid crystal display (LCD) device using the same where the soft mold includes a hydrophilic liquid prepolymer, a photoinitiator and a surface active agent, are provided. A soft mold (207a) is formed by applying the soft mold resist (205a) to a back plate (201) or a master plate and transferring a predefined pattern (B) from the master plate to the soft mold resist. A display is formed by applying the soft mold to an etch resist layer overlying a thin film and transferring the predefined pattern to the etch resist, then etching the thin film using the etch resist as a mask. Additional processing steps are carried out to form the LCD device.
Abstract:
A resist composition used for the imprint lithography process, a method for forming resist pattern using the same, an array substrate manufactured using the same, and method of fabricating the array substrate includes an additive and the adhesion promoter inducing the chemical bond of the base layer contacting to the UV curable resin. As a result, it is possible for the resist composition to form a high-resolution pattern and to improve the durability of the mold for molding a UV curable resin.
Abstract:
A soft mold resist for soft-lithography, a method for fabricating a soft mold, and a method for fabricating a liquid crystal display (LCD) device using the same where the soft mold includes a hydrophilic liquid prepolymer, a photoinitiator; and a surface active agent. A soft mold is formed by applying the soft mold resist to a back plate or a master plate and transferring a predefined pattern from the master plate to the soft mold resist. A display is formed by applying the soft mold to an etch resist layer overlying a thin film and transferring the predefined pattern to the etch resist, then etching the thin film using the etch resist as a mask. Additional processing step are carried out to form the LCD device.
Abstract:
A covering layer is formed on red, green and blue color filters. A mold (17) is set up on the covering layer. The covering layer is first cured through the mold. The mold is removed from the covering layer. The covering layer is subjected to a second curing after the mold is removed. A surface on a glass substrate (11) is divided into color-filter areas (CA) and white- filter areas (WA).
Abstract:
A UV-curable liquid prepolymer (I) comprising (a) 30-60 vol.% monofunctional monomer, (b) 20-50 vol.% bifunctional monomer, (c) 10-20 vol.% trifunctional monomer and (d) a photoinitiator. Independent claims are included for (1) an LCD device comprising two opposite substrates (S1, S2) defined by regular red, green, blue and white sub-pixels, a light-screening layer on other parts (not the sub-pixels), red, green and blue color filter layers on the sub-pixels of S1, a planarised pattern layer of prepolymer (I) over the entire surface of S1, a thin-film transistor (TFT) field on S2, a first orientation layer over the entire surface of S1, a second orientation layer over the whole of S2 (including the TFT field) and a liquid crystal (LC) layer between S1 and S2 (2) a method (M1) for the production of an LCD as above, by preparing S1 and S2 with their sub-pixels, forming the light-screening layers, forming the color filter layers on S1, coating the whole of S1 with prepolymer (I), forming a planarised pattern layer in the sub-pixels on S1 so as to obtain a flat upper surface of prepolymer (I), forming a TFT field on S2 and forming an LC layer between S1 and S2 (3) a method (M2) for the production of an LCD by following M1 up to the formation of color filter layers, then forming a planarised pattern layer of (I) on the entire surface of S1, placing a formed structure with concave and convex sections in contact with (I) and then curing the prepolymer so as to form a white filter layer corresponding to the white sub-pixel, a casing layer over the entire surface of S1 and a column spacer on the casing layer over the light-screening layer, forming a TFT field on S2 and forming an LC layer between S1 and S2.
Abstract:
A method for fabricating a mold includes the steps of forming a photo-polymerizable resin layer between a master substrate and a transparent mold substrate, wherein a first pattern is formed on the master substrate; solidifying the resin layer by exposing the resin layer to a UV light through the transparent mold substrate; and forming a mold having a second pattern by separating the resin layer from the master substrate, wherein the second pattern is in a form of a recess on the resin layer at a portion corresponding to the first pattern and the resin layer being engaged with the mold substrate.
Abstract:
A photo-polymerizable resin layer 25 is formed between a master substrate 21 in which a first pattern 23 is formed and a transparent mould substrate 27. The resin layer is hardened by exposing the resin layer to UV light through the transparent mould substrate. A mould having a second pattern 31 derived from the first pattern is obtained by separating the polymerized resin layer from the master substrate, with the resin layer being engaged with the transparent mould substrate.