Method of fabricating a color filter in liquid crystal display device without using a photo mask
    1.
    发明申请
    Method of fabricating a color filter in liquid crystal display device without using a photo mask 有权
    在不使用光掩模的情况下制造液晶显示装置中的滤色器的方法

    公开(公告)号:US20040126679A1

    公开(公告)日:2004-07-01

    申请号:US10677552

    申请日:2003-10-01

    CPC classification number: G02F1/133516 G02F1/133512 G03F7/0007

    Abstract: A method is presented for fabricating a color filter of a liquid crystal display (LCD) device without using a photo mask. The method includes providing a transparent substrate, depositing a color filter film on the substrate, forming a mask pattern which exposes a part of the color filter film, irradiating the surface of the color filter film, and applying developer to the color filter film to remove the unexposed color filter film and the mask pattern.

    Abstract translation: 提出了一种用于在不使用光掩模的情况下制造液晶显示器(LCD)装置的滤色器的方法。 该方法包括提供透明基板,在基板上沉积滤色膜,形成曝光一部分滤色膜的掩模图案,照射滤色膜的表面,以及将显影剂施加到滤色膜以除去 未曝光的滤色膜和掩模图案。

    Method of fabricating color filter in display device
    2.
    发明申请
    Method of fabricating color filter in display device 有权
    在显示装置中制造滤色器的方法

    公开(公告)号:US20040123753A1

    公开(公告)日:2004-07-01

    申请号:US10679060

    申请日:2003-10-03

    Abstract: A method of fabricating a color filter in a liquid crystal display device includes providing a plurality of clichnulls in which grooves are formed, filling color inks and a black resin in the grooves of the clichnulls, applying the color inks in the clichnulls onto a substrate to form a color filter, and applying a black resin in one of the clichnulls onto the color filter. The color inks and black resin are transferred to the clichnulls from an ink supply container via an ink supplying roller and from the clichnulls to the substrate via a printing roller.

    Abstract translation: 在液晶显示装置中制造彩色滤光片的方法包括提供多个形成凹槽的陈腔,将彩色墨水和黑色树脂填充到底片的凹槽中,将底漆中的彩色墨水涂覆到基底上 形成滤色器,并将黑色树脂施加到滤色器中的一个。 彩色墨水和黑色树脂通过供墨辊从墨水供应容器转移到陈列柱,并通过印刷辊从底漆转移到基板。

    Method for forming pattern using printing process
    3.
    发明申请
    Method for forming pattern using printing process 审中-公开
    使用印刷工艺形成图案的方法

    公开(公告)号:US20030124865A1

    公开(公告)日:2003-07-03

    申请号:US10325841

    申请日:2002-12-23

    Abstract: A method for forming a pattern includes filling resist in a recess of a clichnull corresponding to a position of a pattern to be formed, transferring the resist filled in the recess onto a surface of a transfer roll by rotating the transfer roll on the clichnull, forming a resist pattern by rotating the transfer roll onto a process-subjected layer such that the transfer roll contacts the process-subjected layer of a substrate, ashing resist residuals from the substrate on which the resist pattern is formed using a plasma, and etching the process-subjected layer using one of dry etching and wet etching.

    Abstract translation: 形成图案的方法包括将抗蚀剂填充在对应于要形成的图案的位置的陈列架的凹部中,通过在底片上旋转传送辊将填充在凹部中的抗蚀剂转印到转印辊的表面上,形成 通过将转印辊旋转到加工过程层上使得转印辊接触基板的经处理层,灰化抗蚀剂残留物从其上使用等离子体形成抗蚀剂图案的基板残留,并蚀刻该工艺 - 使用干蚀刻和湿法蚀刻之一的受体层。

    Method for forming pattern using printing process
    4.
    发明申请
    Method for forming pattern using printing process 有权
    使用印刷工艺形成图案的方法

    公开(公告)号:US20040121614A1

    公开(公告)日:2004-06-24

    申请号:US10673190

    申请日:2003-09-30

    Abstract: A method for forming a pattern using a printing process is disclosed in the present invention. The method includes forming a resist layer on a substrate having an etching layer thereon, locating a master having a convex pattern over the substrate, pressing the master against the substrate until the convex pattern of the master directly contacts the etching layer, and removing a portion of the resist layer to expose a surface over the substrate, the removed portion of the resist layer having a width substantially the same as the convex portion of the master.

    Abstract translation: 在本发明中公开了使用印刷方法形成图案的方法。 该方法包括在其上具有蚀刻层的衬底上形成抗蚀剂层,将具有凸形图案的母版定位在衬底上,将母板压靠在衬底上,直到母体的凸形图案直接接触蚀刻层,并且去除部分 的抗蚀剂层以暴露在衬底上的表面,抗蚀剂层的去除部分具有与母体的凸部基本相同的宽度。

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