Abstract:
A method is presented for fabricating a color filter of a liquid crystal display (LCD) device without using a photo mask. The method includes providing a transparent substrate, depositing a color filter film on the substrate, forming a mask pattern which exposes a part of the color filter film, irradiating the surface of the color filter film, and applying developer to the color filter film to remove the unexposed color filter film and the mask pattern.
Abstract:
A method of fabricating a color filter in a liquid crystal display device includes providing a plurality of clichnulls in which grooves are formed, filling color inks and a black resin in the grooves of the clichnulls, applying the color inks in the clichnulls onto a substrate to form a color filter, and applying a black resin in one of the clichnulls onto the color filter. The color inks and black resin are transferred to the clichnulls from an ink supply container via an ink supplying roller and from the clichnulls to the substrate via a printing roller.
Abstract:
A method for forming a pattern includes filling resist in a recess of a clichnull corresponding to a position of a pattern to be formed, transferring the resist filled in the recess onto a surface of a transfer roll by rotating the transfer roll on the clichnull, forming a resist pattern by rotating the transfer roll onto a process-subjected layer such that the transfer roll contacts the process-subjected layer of a substrate, ashing resist residuals from the substrate on which the resist pattern is formed using a plasma, and etching the process-subjected layer using one of dry etching and wet etching.
Abstract:
A method for forming a pattern using a printing process is disclosed in the present invention. The method includes forming a resist layer on a substrate having an etching layer thereon, locating a master having a convex pattern over the substrate, pressing the master against the substrate until the convex pattern of the master directly contacts the etching layer, and removing a portion of the resist layer to expose a surface over the substrate, the removed portion of the resist layer having a width substantially the same as the convex portion of the master.