公开(公告)号：US20040021816A1

公开(公告)日：2004-02-05

申请号：US10420786

申请日：2003-04-23

Applicant: LG. Philips LCD Co. Ltd.

Inventor： Woo-Nam Jeong ,  Hyun-Suk Jin ,  Yong-Jin Cho

IPC: G02F001/1343

CPC classification number: G02F1/133553 ,  G02F1/136286

Abstract: A reflective liquid crystal display device and a fabricating method thereof are disclosed in the present invention. The reflective liquid crystal display device includes a substrate having a pixel region, a gate line on the substrate, a thin film transistor connected to the gate line and the data line, the thin film transistor having a gate electrode, an active layer, and source and drain electrodes, first and second reflective electrodes connected to the drain electrode, the first and second reflective electrodes completely covering the data line and separated by a gap, and a data line crossing the gate line, wherein the data line has a bent shape including first, second, and third portions, and the first portion parallel to the gate line connects the second and third portions, and the second and third portions are formed under the first and second reflective electrodes, respectively.

Abstract translation: 在本发明中公开了一种反射型液晶显示装置及其制造方法。 该反射型液晶显示装置包括具有像素区域的基板，基板上的栅极线，连接到栅极线和数据线的薄膜晶体管，薄膜晶体管具有栅电极，有源层和源极 和漏电极，连接到漏电极的第一反射电极和第二反射电极，第一和第二反射电极完全覆盖数据线并被间隔开，并且与栅极线交叉的数据线，其中数据线具有弯曲形状，包括 第一，第二和第三部分，并且平行于栅极线的第一部分连接第二和第三部分，并且第二和第三部分分别形成在第一和第二反射电极下。

公开(公告)号：US20030124865A1

公开(公告)日：2003-07-03

申请号：US10325841

申请日：2002-12-23

Applicant: LG. Philips LCD Co., Ltd.

Inventor： Myoung-Kee Baek ,  Yong-Jin Cho

IPC: H01L021/311 ,  H01L021/461

CPC classification number: H05K3/0079 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/31138 ,  H01L21/31144 ,  H05K3/061 ,  H05K3/1275 ,  H05K2203/0113 ,  H05K2203/0143 ,  H05K2203/0534 ,  H05K2203/0537 ,  H05K2203/095

Abstract: A method for forming a pattern includes filling resist in a recess of a clichnull corresponding to a position of a pattern to be formed, transferring the resist filled in the recess onto a surface of a transfer roll by rotating the transfer roll on the clichnull, forming a resist pattern by rotating the transfer roll onto a process-subjected layer such that the transfer roll contacts the process-subjected layer of a substrate, ashing resist residuals from the substrate on which the resist pattern is formed using a plasma, and etching the process-subjected layer using one of dry etching and wet etching.

Abstract translation: 形成图案的方法包括将抗蚀剂填充在对应于要形成的图案的位置的陈列架的凹部中，通过在底片上旋转传送辊将填充在凹部中的抗蚀剂转印到转印辊的表面上，形成 通过将转印辊旋转到加工过程层上使得转印辊接触基板的经处理层，灰化抗蚀剂残留物从其上使用等离子体形成抗蚀剂图案的基板残留，并蚀刻该工艺 - 使用干蚀刻和湿法蚀刻之一的受体层。