MELT-INFILTRATION PROCESS FOR FABRICATING ARTICLE EXHIBITING SUBSTANTIAL THREE-DIMENSIONAL ORDER AND RESULTANT ARTICLE

    公开(公告)号:CA2307481A1

    公开(公告)日:2000-11-14

    申请号:CA2307481

    申请日:2000-05-03

    Abstract: A structure, e.g., a photonic band gap material, is provided exhibiting substantial periodicity on a micron scale, along with desirable density and mechanical integrity. A template comprising a colloidal crystal is provided, and into the interstitial space of the crystal is introduced a molten material. The introduction is typically performed and/or promoted by subjecting the crystal and molten material to a pressurized environment, which tends to force the molten material through the interstitial space of the crystal. The material is cooled, and the colloidal crystal particles are typically removed, e.g., by heating, etching, or dissolving. The resulting material constitutes a highly uniform, high-density structure, due to the invention's use of a continuous liquid phase to fill the void volume, as opposed to techniques that result in porosity and non-uniformities within the final structure.

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