THIN FILM RESONATOR AND METHOD FOR MANUFACTURING IT

    公开(公告)号:JP2001094373A

    公开(公告)日:2001-04-06

    申请号:JP2000226698

    申请日:2000-07-27

    Abstract: PROBLEM TO BE SOLVED: To provide a high quality TFR causing a low loss with respect to an electric signal to be impressed to the TFR. SOLUTION: A thin film resonator(TFR) is manufactured so as to have an improved piezoelectric film 46 epitaxially grown on a growing surface 40, and the piezoelectric film comes to have less grain boundaries. The epitaxial growth means the piezoelectric film having a crystallographical azimuth which is taken from the crystallographical azimuth of a single crystal substrate or a growing surface or emulates this. For example, by epitaxially growing the piezoelectric film on a single crystal silicon substrate as the growing surface, an improved piezoelectric film completely or nearly free from a grain boundary is manufactured. According to another aspect of this system, in a method of manufacturing the TFR, the piezoelectric film is first grown on a substrate. Continuously, a part of the substrate is removed and an electrode is accumulated on the one side of the piezoelectric film.

    Thin film resonator apparatus and method of making same

    公开(公告)号:AU4884000A

    公开(公告)日:2001-02-01

    申请号:AU4884000

    申请日:2000-07-26

    Abstract: A thin film resonator (TFR) is produced with an improved piezoelectric film which is epitaxially grown on a growing surface, resulting in a piezoelectric film with less grain boundaries. Epitaxial growth refers to the piezoelectric film having a crystallographic orientation taken from or emulating the crystallographic orientation of a single crystal substrate or growing surface. For example, by epitaxially growing a piezoelectric film on a single crystal silicon substrate as the growing surface, an improved piezoelectric film is produced with little or no grain boundaries. In accordance with another aspect of the present invention, a method of making a TFR is disclosed in which the piezoelectric film is grown on a substrate. Subsequently, a portion of the substrate is removed, and the electrodes are deposited on either side of the piezoelectric film.

    3.
    发明专利
    未知

    公开(公告)号:DE60036988D1

    公开(公告)日:2007-12-20

    申请号:DE60036988

    申请日:2000-07-17

    Abstract: A thin film resonator (TFR) is produced with an improved piezoelectric film which is epitaxially grown on a growing surface, resulting in a piezoelectric film with less grain boundaries. Epitaxial growth refers to the piezoelectric film having a crystallographic orientation taken from or emulating the crystallographic orientation of a single crystal substrate or growing surface. For example, by epitaxially growing a piezoelectric film on a single crystal silicon substrate as the growing surface, an improved piezoelectric film is produced with little or no grain boundaries. In accordance with another aspect of the present invention, a method of making a TFR is disclosed in which the piezoelectric film is grown on a substrate. Subsequently, a portion of the substrate is removed, and the electrodes are deposited on either side of the piezoelectric film.

    4.
    发明专利
    未知

    公开(公告)号:DE60036988T2

    公开(公告)日:2008-08-28

    申请号:DE60036988

    申请日:2000-07-17

    Abstract: A thin film resonator (TFR) is produced with an improved piezoelectric film which is epitaxially grown on a growing surface, resulting in a piezoelectric film with less grain boundaries. Epitaxial growth refers to the piezoelectric film having a crystallographic orientation taken from or emulating the crystallographic orientation of a single crystal substrate or growing surface. For example, by epitaxially growing a piezoelectric film on a single crystal silicon substrate as the growing surface, an improved piezoelectric film is produced with little or no grain boundaries. In accordance with another aspect of the present invention, a method of making a TFR is disclosed in which the piezoelectric film is grown on a substrate. Subsequently, a portion of the substrate is removed, and the electrodes are deposited on either side of the piezoelectric film.

    THIN FILM RESONATOR APPARATUS AND METHOD OF MAKING SAME

    公开(公告)号:CA2314375A1

    公开(公告)日:2001-01-29

    申请号:CA2314375

    申请日:2000-07-24

    Abstract: A thin film resonator (TFR) is produced with an improved piezoelectric fi lm which is epitaxially grown on a growing surface, resulting in a piezoelectri c film with less grain boundaries. Epitaxial growth refers to the piezoelectric film having a crystallographic orientation taken from or emulating the crystallographic orientation of a single crystal substrate or growing surface. For example, by epitaxiall y growing a piezoelectric film on a single crystal silicon substrate as the growing surface, an improved piezoelectric film is produced with little or no grain boundaries. In accordance with another aspect of the present invention, a method of making a TFR is disclosed in which the piezoelectric film is grown on a substrate. Subsequently, a portion of the substrate is removed, and the electrodes are deposited on either side of the piezoelectric film.

    THIN FILM RESONATOR APPARATUS AND METHOD OF MAKING SAME

    公开(公告)号:CA2314375C

    公开(公告)日:2003-11-18

    申请号:CA2314375

    申请日:2000-07-24

    Abstract: A thin film resonator (TFR) is produced with an improved piezoelectric fi lm which is epitaxially grown on a growing surface, resulting in a piezoelectri c film with less grain boundaries. Epitaxial growth refers to the piezoelectric film having a crystallographic orientation taken from or emulating the crystallographic orientation of a single crystal substrate or growing surface. For example, by epitaxiall y growing a piezoelectric film on a single crystal silicon substrate as the growing surface, an improved piezoelectric film is produced with little or no grain boundaries. In accordance with another aspect of the present invention, a method of making a TFR is disclosed in which the piezoelectric film is grown on a substrate. Subsequently, a portion of the substrate is removed, and the electrodes are deposited on either side of the piezoelectric film.

    7.
    发明专利
    未知

    公开(公告)号:BR0002976A

    公开(公告)日:2001-03-13

    申请号:BR0002976

    申请日:2000-07-19

    Abstract: A thin film resonator (TFR) is produced with an improved piezoelectric film which is epitaxially grown on a growing surface, resulting in a piezoelectric film with less grain boundaries. Epitaxial growth refers to the piezoelectric film having a crystallographic orientation taken from or emulating the crystallographic orientation of a single crystal substrate or growing surface. For example, by epitaxially growing a piezoelectric film on a single crystal silicon substrate as the growing surface, an improved piezoelectric film is produced with little or no grain boundaries. In accordance with another aspect of the present invention, a method of making a TFR is disclosed in which the piezoelectric film is grown on a substrate. Subsequently, a portion of the substrate is removed, and the electrodes are deposited on either side of the piezoelectric film.

Patent Agency Ranking