1.
    发明专利
    未知

    公开(公告)号:DE69715056D1

    公开(公告)日:2002-10-10

    申请号:DE69715056

    申请日:1997-01-14

    Abstract: Fine patterns of metal or insulator can be formed on printed circuit board using conventional lithographic steppers with inverted projection lenses. The inverted projection lenses act as enlargement lenses rather than reducing lenses and exhibit a large depth of focus sufficient to accommodate the deviations of PC board from planarity. The inverted lens reduces the size of the image needed at the mask, permitting multiple mask levels to be combined on a single glass. This reduces the cost of the mask set and permits the use of smaller glass masks having greater accuracy and dimensional stability than the convention mylar masks used for PC board. By inverting the projection lenses on near-obsolete steppers, applicants were able to form metal patterns on PC board of finer dimension than heretofore reported. Inverting a 5X ZEISS lens on a GCA 6300A stepper, applicants were able to form vias of less than 25 mu m diameter, pattern metal lines and spaces of less than 25 mu m, and obtain overlay registration accuracy of less than 25 mu m. The field size was larger than 1 in , and the depth of focus was greater than 50 mu m.

    2.
    发明专利
    未知

    公开(公告)号:DE69715056T2

    公开(公告)日:2003-05-22

    申请号:DE69715056

    申请日:1997-01-14

    Abstract: Fine patterns of metal or insulator can be formed on printed circuit board using conventional lithographic steppers with inverted projection lenses. The inverted projection lenses act as enlargement lenses rather than reducing lenses and exhibit a large depth of focus sufficient to accommodate the deviations of PC board from planarity. The inverted lens reduces the size of the image needed at the mask, permitting multiple mask levels to be combined on a single glass. This reduces the cost of the mask set and permits the use of smaller glass masks having greater accuracy and dimensional stability than the convention mylar masks used for PC board. By inverting the projection lenses on near-obsolete steppers, applicants were able to form metal patterns on PC board of finer dimension than heretofore reported. Inverting a 5X ZEISS lens on a GCA 6300A stepper, applicants were able to form vias of less than 25 mu m diameter, pattern metal lines and spaces of less than 25 mu m, and obtain overlay registration accuracy of less than 25 mu m. The field size was larger than 1 in , and the depth of focus was greater than 50 mu m.

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