Process for selectively plating areas of a substrate

    公开(公告)号:AU2695202A

    公开(公告)日:2002-06-18

    申请号:AU2695202

    申请日:2001-11-14

    Applicant: MACDERMID INC

    Abstract: A process for the selective activation and plating of a substrate is disclosed. The process involves the application of an activator composition to a substrate in a predetermined pattern by means of a print head wherein the print head moves across the surface of the substrate and selectively deposits the activator composition in said predetermined pattern upon the substrate. The selectively activated substrate is then subjected to electroless plating.

    PROCESS FOR SELECTIVELY PLATING AREAS OF A SUBSTRATE
    2.
    发明申请
    PROCESS FOR SELECTIVELY PLATING AREAS OF A SUBSTRATE 审中-公开
    选择性地涂覆基材面积的过程

    公开(公告)号:WO0247446A3

    公开(公告)日:2002-10-10

    申请号:PCT/US0143865

    申请日:2001-11-14

    Applicant: MACDERMID INC

    CPC classification number: H05K3/182 C23C18/1608 C23C18/30

    Abstract: A process for the selective activation and plating of a substrate is disclosed. The process involves the application of an activator composition to a substrate in a predetermined pattern by means of a print head wherein the print head moves across the surface of the substrate and selectively deposits the activator composition in said predetermined pattern upon the substrate. The selectively activated substrate is then subjected to electroless plating.

    Abstract translation: 公开了一种选择性激活和电镀衬底的方法。 该方法涉及通过印刷头以预定图案将活化剂组合物施加到基材上,其中印刷头在基材表面上移动并且选择性地将活化剂组合物以所述预定图案沉积在基材上。 然后对选择性活化的基材进行无电镀。

Patent Agency Ranking