公开(公告)号：DE602006021613D1

公开(公告)日：2011-06-09

申请号：DE602006021613

申请日：2006-08-28

Applicant: MACDERMID INC

Inventor： FENG KESHENG ,  HART DANIEL J

IPC: G03F7/30

公开(公告)号：EP2225611A4

公开(公告)日：2011-03-02

申请号：EP08871832

申请日：2008-12-11

Applicant: MACDERMID INC

Inventor： GANJEI JOHN ,  HART DANIEL J ,  ABBOTT STEVEN ,  SHELDON MARK

IPC: G03C1/805

CPC classification number: G03F7/161 ,  G03F7/027 ,  G03F7/092 ,  H05K3/0082 ,  H05K3/064 ,  H05K2201/0108 ,  H05K2203/107

公开(公告)号：EP1958028A4

公开(公告)日：2009-04-08

申请号：EP06790025

申请日：2006-08-28

Applicant: MACDERMID INC

Inventor： FENG KESHENG ,  HART DANIEL J

IPC: G03F7/30

CPC classification number: G03F7/322

Abstract: An improved composition and method for the development of resists is disclosed. The method comprises contacting the resist with a developer solution comprising a source of alkalinity and a cationic surfactant which is an ethoxylated and/or propoxylated tallow amine. The improved developer solution more effectively removes the uncured resist from the resist coated surface.