公开(公告)号：AU8173487A

公开(公告)日：1988-05-06

申请号：AU8173487

申请日：1987-10-16

Applicant: MACDERMID INC

Inventor： GAL CHAVA ,  BEN-SHUSHAN GIORA ,  SHALOM EITAN

IPC: G03F7/38 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  G03C1/54 ,  G03C1/60 ,  G03F7/26

公开(公告)号：EP0288533A4

公开(公告)日：1989-02-06

申请号：EP87907391

申请日：1987-10-16

Applicant: MACDERMID INC

Inventor： GAL CHAVA ,  BEN-SHUSHAN GIORA ,  SHALOM EITAN

IPC: G03F7/38 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022

CPC classification number: G03F7/0226

Abstract: A light-sensitive composition and method which can be used to produce photoresist images. The composition comprises a mixture of a novolak resin, a 1,2-quinonediazide sensitizer and sufficient quantities of one or more organic stabilizing compounds to render the total composition soluble in alkaline developer. In producing a negative image the composition is exposed imagewise to actinic radiation, thereafter heated to render the exposed image insoluble to alkaline developer, and the unexposed composition is then removed using alkaline developer without the necessity to subject the unexposed composition to exposure to actinic radiation prior to the development stage.