公开(公告)号：AU8173487A

公开(公告)日：1988-05-06

申请号：AU8173487

申请日：1987-10-16

Applicant: MACDERMID INC

Inventor： GAL CHAVA ,  BEN-SHUSHAN GIORA ,  SHALOM EITAN

IPC: G03F7/38 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  G03C1/54 ,  G03C1/60 ,  G03F7/26

公开(公告)号：CA2091286A1

公开(公告)日：1994-01-21

申请号：CA2091286

申请日：1993-03-09

Applicant: MACDERMID INC

Inventor： GRUNWALD JOHN ,  GAL CHAVA ,  HIRSH SHULAMIT ,  MOZEL JACOB

IPC: G03F7/004 ,  B41M5/36 ,  C08G59/50 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  H05K3/00 ,  H05K3/06 ,  H05K3/18 ,  H05K3/28 ,  H05K3/46 ,  B41M5/24 ,  H05K3/02

Abstract: A process is described for the direct production of an imaged pattern of resist on a substrate surface (such as a pattern of etch-resistant organic resin material on the surface of a copper-clad dielectric in connection with a printed circuit board (PCB) fabrication process), which process utilizes thermo-resists rather than photoresists, i.e., compositions which undergo thermally-induced, rather than photo-induced, chemical transformations. A film of thermo-resist composition applied to the substrate surface is scanned by a focused heat source (e.g., a thermal laser emitting in the IR region) in a predetermined pattern, without a phototool, to bring about localized thermally-induced chemical transformations of the composition which either directly produce the resist pattern or produce in the film a developable latent image of the pattern.

公开(公告)号：EP0288533A4

公开(公告)日：1989-02-06

申请号：EP87907391

申请日：1987-10-16

Applicant: MACDERMID INC

Inventor： GAL CHAVA ,  BEN-SHUSHAN GIORA ,  SHALOM EITAN

IPC: G03F7/38 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022

CPC classification number: G03F7/0226

Abstract: A light-sensitive composition and method which can be used to produce photoresist images. The composition comprises a mixture of a novolak resin, a 1,2-quinonediazide sensitizer and sufficient quantities of one or more organic stabilizing compounds to render the total composition soluble in alkaline developer. In producing a negative image the composition is exposed imagewise to actinic radiation, thereafter heated to render the exposed image insoluble to alkaline developer, and the unexposed composition is then removed using alkaline developer without the necessity to subject the unexposed composition to exposure to actinic radiation prior to the development stage.