公开(公告)号：US20100196660A1

公开(公告)日：2010-08-05

申请号：US12699171

申请日：2010-02-03

Applicant: MARTIN DRESSLER

Inventor： MARTIN DRESSLER

IPC: G03F7/20 ,  B32B3/10 ,  B32B3/26 ,  B32B3/30 ,  A61F2/02

CPC classification number: G03F7/0035 ,  B81C1/00087 ,  B81C2201/0197 ,  G03F7/0037 ,  G03F7/0047 ,  G03F7/09 ,  G03F7/091 ,  G03F7/38 ,  Y10T428/24331 ,  Y10T428/24752 ,  Y10T428/2495

Abstract: The invention relates to a method for producing micro-structured shaped parts (22) and the resulting products, wherein a first negative or positive photosensitive layer (12) with a layer thickness (D1) is deposited on a substrate (10) and the first negative or positive photosensitive layer (12) is exposed area-by-area with light of a suitable wavelength; a second negative or positive photosensitive layer (12′) with a layer thickness (D2) is deposited on the first negative or positive photosensitive layer (12) and exposed area-by-area with light of a suitable wavelength, wherein the exposed regions (16′) in the second layer (12′) are identical to and/or different from the exposed regions (16) in the first layer (12); the steps of depositing and exposing the photosensitive layer (12, 12′) area-by-area are performed repeatedly until a predetermined height H is attained, wherein the exposed regions (16, 16′) of the photosensitive layers (12, 12′) represent the positive or negative of the microstructure of the shaped part (22); the exposed (16, 16′) or the unexposed regions (18, 18′) of the shaped part (22) are washed out with a developer; and the remaining preform (20) is subsequently solidified.

Abstract translation: 本发明涉及一种用于生产微结构成形部件（22）和所得产品的方法，其中具有层厚度（D1）的第一负或正感光层（12）沉积在基板（10）上，第一 负的或正的感光层（12）用合适的波长的光线逐个曝光; 具有层厚度（D2）的第二负或正感光层（12'）沉积在第一负或正光敏层（12）上，并且用适当波长的光曝光逐个区域，其中曝光区域 16'）与第一层（12）中的暴露区域（16）相同和/或不同; 反复进行逐层沉积和曝光感光层（12,12'）的步骤，直到达到预定高度H，其中感光层（12,12'）的曝光区域（16,16'） ）表示成形部（22）的微结构的正或负。 用显影剂冲洗成形部件（22）的暴露（16,16'）或未曝光区域（18,18'）; 然后将剩余的预制件（20）固化。