Abstract:
A multi-state NAND memory cell is comprised of two drain/source areas in a substrate. An oxide - nitride - oxide structure is formed above the substrate between the drain/source areas. The nitride layer acting as an asymmetric charge trapping layer. A control gate is located above the oxide - nitride - oxide structure. An asymmetrical bias on the drain/source areas causes the drain/source area with the higher voltage to inject an asymmetric distribution hole by gate induced drain leakage injection into the trapping layer substantially adjacent that drain/source area.
Abstract:
An array of memory cells configured to store at least one bit per one F 2 includes substantially vertical structures providing an electronic memory function spaced apart a distance equal to one half of a minimum pitch of the array. The structures providing the electronic memory function are configured to store more than one bit per gate. The array also includes electrical contacts to the memory cells including the substantially vertical structures. The cells can be programmed to have one of a number of charge levels trapped in the gate insulator adjacent to the first source/drain region such that the channel region has a first voltage threshold region (Vtl) and a second voltage threshold region (Vt2) and such that the programmed cell operates at reduced drain source current.
Abstract:
Methods and devices are disclosed which provide for memory devices having reduced memory cell square feature sizes. Such square feature sizes can permit large memory devices, on the order of a gigabyte or large, to be fabricated on one chip or die. The methods and devices disclosed, along with variations of them, utilize three dimensions as opposed to other memory devices which are fabricated in only two dimensions. Thus, the methods and devices disclosed , along with variations, contains substantially horizontal and vertical components.
Abstract:
Methods, systems, and devices for operating a ferroelectric memory cell or cells are described, A cell may be written with a value that is intended to convey a different logic state than may typically be associated with the value. For example, a cell that has stored a charge associated with one logic state for a time period may be re-written to store a different charge, and the re-written cell may still be read to have the originally stored logic state. An indicator may be stored in a latch to indicate whether the logic state currently stored by the cell is the intended logic state of the cell. A cell may, for example, be re-written with an opposite value periodically, based on the occurrence of an event, or based on a determination that the cell has stored one value (or charge) for a certain time period.
Abstract translation:描述了用于操作一个或多个铁电存储器单元的方法,系统和设备。单元可以被写入具有旨在传达与典型地与该值相关联的不同逻辑状态的值的值 。 例如,已经存储与一个逻辑状态相关的电荷一段时间的单元可以被重新写入以存储不同的电荷,并且重写的单元仍可以被读取以具有原始存储的逻辑状态。 指示器可被存储在锁存器中以指示当前由单元存储的逻辑状态是否是单元的预期逻辑状态。 例如,可以基于事件的发生或者基于确定小区已经存储了一个值(或电荷)达特定时间段,来周期性地重新写入小区。 p >
Abstract:
A configuration for a laser fuse bank is disclosed wherein the available space is more efficiently used. Fuses (101, 102, 103) of graduated width and variable configuration are placed so as to minimize the average distance between fuses and maximize fuse density. Alternatively, a common source is added to a standard laser fuse structure such that it intersects the fuses and the number of available fuses is doubled.
Abstract:
A configuration for a laser fuse bank is disclosed wherein the available space is more efficiently used. Fuses (101, 102, 103) of graduated width and variable configuration are placed so as to minimize the average distance between fuses and maximize fuse density. Alternatively, a common source is added to a standard laser fuse structure such that it intersects the fuses and the number of available fuses is doubled.
Abstract:
A multi-state NAND memory cell is comprised of two drain/source areas in a substrate. An oxide - nitride - oxide structure is formed above the substrate between the drain/source areas. The nitride layer acting as an asymmetric charge trapping layer. A control gate is located above the oxide - nitride - oxide structure. An asymmetrical bias on the drain/source areas causes the drain/source area with the higher voltage to inject an asymmetric distribution hole by gate induced drain leakage injection into the trapping layer substantially adjacent that drain/source area.
Abstract:
A configuration for a laser fuse bank is disclosed wherein the available space is more efficiently used. Fuses (101, 102, 103) of graduated width and variable configuration are placed so as to minimize the average distance between fuses and maximize fuse density. Alternatively, a common source is added to a standard laser fuse structure such that it intersects the fuses and the number of available fuses is doubled.
Abstract:
Method and electronic memory device to avoid imprint in a ferroelectric memory, the electronic memory device, comprising: a memory cell; a latch coupled with the memory cell; and a sense component coupled with the memory cell and the latch, the sense component operable to: determine a first logic state stored on the memory cell; receive an indicator stored on the latch indicating whether the first logic state stored on the memory cell is an intended logic state; and output a second logic state different from the first logic state stored on the memory cell based at least in part on the indicator stored on the latch.