公开(公告)号：WO1994026424A1

公开(公告)日：1994-11-24

申请号：PCT/US1994005299

申请日：1994-05-12

Applicant: MIDWEST RESEARCH INSTITUTE

Inventor： MIDWEST RESEARCH INSTITUTE ,  PITTS, John, Roland ,  TRACY, Edwin, C. ,  KING, David, E. ,  STANLEY, James, T.

IPC: B05D03/06

CPC classification number: C23C16/27 ,  C23C16/481 ,  Y10S427/103

Abstract: A chemical vapor deposition method for depositing transparent continuous coatings of sp -bonded diamond carbon films, comprising: a) providing a volatile hydrocarbon gas/H2 reactant mixture in a cold wall vacuum chemical vapor deposition chamber (13) containing a substrate (14) for said films, at pressure of about 1 to 50 Torr; and b) directing a concentrated solar flux (15) of from about 40 to about 60 watts/cm through said reactant mixture to produce substrate temperatures of about 750 DEG C to about 950 DEG C to activate deposition of the film on said substrate (14).

Abstract translation: 一种用于沉积sp 3结合金刚石碳膜的透明连续涂层的化学气相沉积方法，包括：a）在含有底物的冷壁真空化学气相沉积室（13）中提供挥发性烃气/ H 2反应物混合物 14），在约1至50托的压力下; 和b）通过所述反应物混合物引导约40至约60瓦特/平方厘米的浓缩太阳能通量（15）以产生约750℃至约950℃的基板温度，以激活所述薄膜在所述 衬底（14）。