-
公开(公告)号:GB2295624B
公开(公告)日:1998-07-29
申请号:GB9524407
申请日:1995-11-29
Applicant: MOTOROLA INC
Inventor: MEGERA YAROSLAW A , SAVIC JOVICA , BROWN VERNON L
Abstract: A method for metallizing selected areas of a two dielectric layered sequentially processed circuit board (100) involves exposing the resin A (204) by photo-definition. The resin A (204) contains 10% or less, by weight Cu2O particles (300) mixed uniformly throughout the resin. The circuit board (100) is sprayed with a reduction solution to form catalytic islands (301) predominately of Cu0 or CuH. The circuit board (100) is then electrolessly plated to form conductors, pads or vias, where the resin A (204) has been exposed. The reduction solution includes a primary reducing agent, a secondary reducing agent and a capturing agent. The reduction solution preferably has a pH of 10 or greater. The primary reducing agent is preferably a borohydride. The secondary reducing agent is preferably an iodide and the capturing agent is a chelating agent preferably EDTA.
-
公开(公告)号:GB2295624A
公开(公告)日:1996-06-05
申请号:GB9524407
申请日:1995-11-29
Applicant: MOTOROLA INC
Inventor: MEGERA YAROSLAW A , SAVIC JOVICA , BROWN VERNON L
Abstract: A method for metallizing selected areas of a two dielectric layered sequentially processed circuit board involves exposing the resin A 204 by photo-definition. The resin A 204 contains 10% or less, by weight Cu2O particles 300 mixed uniformly throughout the resin. The circuit board is sprayed with a reduction solution to form catalytic islands 301 predominately of Cu or CuH. The circuit board is then electrolessly plated to form conductors, pads or vias, where the resin A 204 has been exposed. The reduction solution includes a primary reducing agent, a secondary reducing agent and a capturing or chelating agent. The reduction solution preferably has a pH of 10 or greater. The primary reducing agent is preferably a borohydride. The secondary reducing agent is preferably an iodide and the capturing agent is a chelating agent preferably EDTA.
-