公开(公告)号：US20170304878A1

公开(公告)日：2017-10-26

申请号：US15135138

申请日：2016-04-21

Applicant: Mapper Lithography IP B.V.

Inventor： Marc Smits ,  Johan Joost Koning ,  Chris Franciscus Jessica Lodewijk ,  Hindrik Willem Mook ,  Ludovic Lattard

IPC: B08B7/04 ,  B08B17/02 ,  H01J37/147 ,  H01J37/18

CPC classification number: B08B7/04 ,  B08B17/02 ,  H01J37/02 ,  H01J37/1472 ,  H01J37/18 ,  H01J37/3177 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/0492

Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：US09981293B2

公开(公告)日：2018-05-29

申请号：US15135138

申请日：2016-04-21

Applicant: Mapper Lithography IP B.V.

Inventor： Marc Smits ,  Johan Joost Koning ,  Chris Franciscus Jessica Lodewijk ,  Hindrik Willem Mook ,  Ludovic Lattard

IPC: G01F23/00 ,  B08B7/04 ,  H01J37/18 ,  H01J37/147 ,  B08B17/02

CPC classification number: B08B7/04 ,  B08B17/02 ,  H01J37/02 ,  H01J37/1472 ,  H01J37/18 ,  H01J37/3177 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/0492

Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.