公开(公告)号：US20130207004A1

公开(公告)日：2013-08-15

申请号：US13761189

申请日：2013-02-07

Applicant: Media Lario, S.R.L.

Inventor： Natale M. Ceglio ,  Daniel STEARNS ,  Jacques KOOLS ,  Giuseppe VALSECCHI ,  Fabio ZOCCHI ,  Riccardo BINDA

IPC: H05G2/00 ,  G02B5/20

CPC classification number: H05G2/005 ,  G02B5/203 ,  G02B19/0095 ,  G02B27/425 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70916 ,  G21K1/067 ,  H05G2/008 ,  G21K2201/06 ,  G21K2201/064

Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.

Abstract translation: 公开了用于EUV光刻系统的源极集电极模块，其中源极 - 集电极模块采用激光产生的等离子体EUV辐射源和放电入射收集器。 通过首先形成低密度等离子体，然后用足够强度的红外辐射照射低密度等离子体来产生EUV辐射源，以产生最终的EUV发射等离子体。 掠入射收集器可以包括被配置为防止红外辐射到达中间焦点的光栅。 使用碎片减轻装置可以保持源 - 收集器模块的使用寿命。