公开(公告)号：WO2009102551A3

公开(公告)日：2009-08-20

申请号：PCT/US2009/032130

申请日：2009-01-27

Applicant: MICRON TECHNOLOGY, INC. ,  MILLWARD, Dan, B. ,  STUEN, Karl

Inventor： MILLWARD, Dan, B. ,  STUEN, Karl

IPC: B81C1/00

Abstract: Methods for fabricating sublithographic, nanoscalc microstructures in one-dimensional arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

公开(公告)号：EP2262721A2

公开(公告)日：2010-12-22

申请号：EP09711291.6

申请日：2009-01-27

Applicant: Micron Technology, INC.

Inventor： MILLWARD, Dan, B. ,  STUEN, Karl

IPC: B81C1/00

CPC classification number: H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/0002 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/76816 ,  Y10S977/778 ,  Y10S977/784 ,  Y10S977/789 ,  Y10S977/79 ,  Y10T428/24058 ,  Y10T428/24124 ,  Y10T428/24174 ,  Y10T428/24182

Abstract: Methods for fabricating sublithographic, nanoscalc microstructures in one-dimensional arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

Abstract translation: 提供了利用自组装嵌段共聚物在一维阵列中制造亚光刻纳米晶微结构的方法，以及由这些方法形成的膜和器件。