公开(公告)号：JP2002276663A

公开(公告)日：2002-09-25

申请号：JP2001076290

申请日：2001-03-16

Applicant: NAT INST FOR MATERIALS SCIENCE

Inventor： KASAHARA AKIRA ,  GOTO MASAHIRO ,  TOSA MASAHIRO ,  YOSHIHARA KAZUHIRO

IPC: F16C33/12 ,  C25F5/00 ,  C25F7/00

Abstract: PROBLEM TO BE SOLVED: To prevent agglutination and galling of a sliding machine in vacuum by suppressing increase in a friction coefficient in the vacuum and to contribute to energy saving of vacuum related devices by producing super-clean, long-life, and maintenance-free devices. SOLUTION: In the surface processing of a vacuum sliding material, the surface maximum roughness of the sliding material by mechanical or chemical polishing is set to within a range from 70 nm-200 nm.

公开(公告)号：JP2003119578A

公开(公告)日：2003-04-23

申请号：JP2001316973

申请日：2001-10-15

Applicant: NAT INST FOR MATERIALS SCIENCE

Inventor： GOTO MASAHIRO ,  KASAHARA AKIRA ,  TOSA MASAHIRO ,  YOSHIHARA KAZUHIRO

IPC: F16C33/12 ,  C23C14/34 ,  C23C30/00

Abstract: PROBLEM TO BE SOLVED: To provide a low-friction material, which stably has superior low- friction characteristics in atmospheres of the air to an ultra-high vacuum, and has such high durability and the long life as to enable the material to be repeatedly used in humid to dry conditions. SOLUTION: The low-friction material has a thin film of a copper oxide formed on the surface of a substrate, and shows the low-friction characteristics in atmospheres of the air to the ultra-high vacuum.

公开(公告)号：EP1693703A4

公开(公告)日：2010-08-04

申请号：EP04818568

申请日：2004-11-15

Applicant: NAT INST FOR MATERIALS SCIENCE

Inventor： OISHI TETSUO ,  GOTO MASAHIRO ,  KASAHARA AKIRA ,  TOSA MASAHIRO ,  YOSHIHARA KAZUHIRO

IPC: G03F7/004 ,  G03F7/038 ,  B32B3/00 ,  B82B3/00 ,  C08J7/04 ,  G02B1/02 ,  G02B6/12 ,  G03F7/20 ,  G03F7/38 ,  G03F7/40

CPC classification number: G03F7/40

公开(公告)号：EP1642997A4

公开(公告)日：2008-04-02

申请号：EP04729286

申请日：2004-04-23

Applicant: NAT INST FOR MATERIALS SCIENCE

Inventor： GOTO MASAHIRO ,  KASAHARA AKIRA ,  OISHI TETSUO ,  TOSA MASAHIRO ,  YOSHIHARA KAZUHIRO

IPC: C23C14/08 ,  C23C14/34

CPC classification number: C23C14/3414 ,  C23C14/08 ,  C23C14/087

Abstract: A copper oxide thin film mainly containing CuO is formed by a plasma film-forming process on a substrate for film formation. The friction coefficient of the copper oxide thin film can be controlled remarkably low.

公开(公告)号：EP2792717A4

公开(公告)日：2014-10-22

申请号：EP12856666

申请日：2012-12-13

Applicant: NAT INST FOR MATERIALS SCIENCE

Inventor： SASAKI MICHIKO ,  GOTO MASAHIRO ,  KASAHARA AKIRA ,  CHIKYO TOYOHIRO ,  TOSA MASAHIRO

IPC: C08L101/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08K3/00 ,  C08K5/00

CPC classification number: C08K3/22 ,  B82Y30/00 ,  B82Y40/00 ,  C08K3/013 ,  C08K5/0025 ,  C08K2003/2265 ,  C08K2003/2268 ,  C08K2201/01 ,  C08L2205/16 ,  Y10T428/298 ,  Y10T428/31938

Abstract: Provided is a polymer nanowire which contains nanoparticles so as to have new functionalities. A thin film 103 is formed on a substrate 101 and includes functional nanoparticles and polymers, and further includes a photosensitive pigment as required. The thin film 103 is irradiated with a pulsed laser. This causes a polymer nanowire 109 containing the functional nanoparticles to grow from a surface of the thin film 103.

公开(公告)号：EP2620518A4

公开(公告)日：2014-03-05

申请号：EP11826710

申请日：2011-09-02

Applicant: NAT INST FOR MATERIALS SCIENCE

Inventor： GOTO MASAHIRO ,  KASAHARA AKIRA ,  TOSA MASAHIRO

IPC: C23C14/08

CPC classification number: C09D5/00 ,  C23C14/086

公开(公告)号：DE602004028620D1

公开(公告)日：2010-09-23

申请号：DE602004028620

申请日：2004-04-23

Applicant: NAT INST FOR MATERIALS SCIENCE

Inventor： GOTO MASAHIRO ,  KASAHARA AKIRA ,  OISHI TETSUO ,  TOSA MASAHIRO ,  YOSHIHARA KAZUHIRO

IPC: C23C14/08 ,  C23C14/34