公开(公告)号：JP2001269565A

公开(公告)日：2001-10-02

申请号：JP2000087581

申请日：2000-03-27

Applicant: NAT INST OF ADVANCED IND SCIEN

Inventor： HATADA KIYOTAKA ,  IKUSHIMA YUTAKA ,  TORII KAZUO

IPC: G01N30/56 ,  B01J3/02

Abstract: PROBLEM TO BE SOLVED: To provide a substrate introduction method for a reactor under high temperature and high pressure. SOLUTION: A running reaction system is characterized by a constitution in which a means for stably introducing a substrate into a reactor under the high temperature and high pressure are added to the system, namely such means as a high pressure pump, the reactor, a pressure adjuster for adjusting the pressure inside a reaction system, a slurry feed tank, feed liquid balance coils for adjusting the flow rate of the liquid fed into the reactor and the slurry feed tank and and a screw for feeding slurry as constituting components, and a liquid flow is pressed into the reaction system with the high pressure pump to feed a liquid into the reactor and the slurry feed tank, and the pressure of the above feed lines (balance coils) is equalized by the adjustment carried out by the pressure adjuster so that the reaction system is adjusted not to generate the pressure fluctuation in the reaction system, and the substrate in the slurry feed tank is introduced into the reactor by rotating the slurry feed screw. Also, a substrate introduction method for the reactor by using the reaction system is provided.