公开(公告)号：US20210356369A1

公开(公告)日：2021-11-18

申请号：US17391017

申请日：2021-08-01

Applicant: NCS Testing Technology CO.,LTD

Inventor： Haizhou WANG ,  Qun REN ,  Lei ZHAO ,  Xuejing SHEN ,  Hui WANG ,  Dongling LI ,  Weihao WAN ,  Wenyu ZHANG ,  Xing YU ,  Lixia YANG

IPC: G01N3/12

Abstract: The present invention discloses a high throughput statistical characterization method of metal micromechanical properties, which comprises: grinding and polishing a metal sample until specular reflection finish satisfies a test requirement; marking position coordinates of a to-be-measured area on the metal sample by a microhardness tester to ensure the comparison of the same to-be-measured area; conducting an isostatic pressing strain test on the to-be-measured area by an isostatic pressing technology; and comparing high throughput characterization of components, microstructures, microdefects and three-dimensional surface morphology of the metal sample before and after isostatic pressing strain to obtain the full-view-field cross-scale high throughput statistical characterization of micromechanical property uniformity of the metal sample.

公开(公告)号：US20220205922A1

公开(公告)日：2022-06-30

申请号：US17315235

申请日：2021-05-07

Applicant: NCS Testing Technology CO.,LTD

Inventor： Xing YU ,  Haizhou WANG ,  Xuejing SHEN ,  Xiaojia Li ,  Yifei ZHU ,  Weihao WAN ,  Yuhua LU ,  Hui WANG ,  Qun REN ,  Yongqing WANG ,  Zhenzhen WAN

IPC: G01N21/67 ,  H01J49/06 ,  C23C14/34 ,  H01J49/12 ,  H01J49/04

Abstract: An apparatus and a method for preparing glow discharge sputtering samples for materials microscopic characterization are provided. The apparatus includes a glow discharge sputtering unit, a glow discharge power supply, a gas circuit automatic control unit, a spectrometer, and a computer. The structure of the glow discharge sputtering unit is optimized to be more suitable for sample preparation by simulation. By adding a magnetic field to the glow discharge plasma, uniform sample sputtering is realized within a large size range of the sample surface. The spectrometer monitors multi-element signal in a depth direction of the sample sputtering, so that precise preparation of different layer microstructures is realized. In conjunction with the acquisition of the sample position marks and the precise spatial coordinates (x, y, z) information, the correspondence between the surface space coordinates and the microstructure of the sample is conveniently realized.