公开(公告)号：US20200294760A1

公开(公告)日：2020-09-17

申请号：US16669274

申请日：2019-10-30

Applicant: THE NCS TESTING TECHNOLOGY CO., LTD.

Inventor： Haizhou WANG ,  Xing YU ,  Xuejing SHEN ,  Yunhai JIA ,  Xiaojia LI ,  Yuhua LU ,  Weihao WAN ,  Jianqiu LUO ,  Dongling LI ,  Lei ZHAO

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/34 ,  H01J37/20 ,  G06T15/08 ,  G06T11/20 ,  C23C14/34

Abstract: An apparatus and method for a large-scale high-throughput quantitative characterization and three-dimensional reconstruction of a material structure. The apparatus having a glow discharge sputtering unit, a sample transfer device, a scanning electron microscope unit and a GPU computer workstation. The glow discharge sputtering unit can achieve large size (cm order), nearly flat and fast sample preparation, and controllable achieve layer-by-layer ablation preparation along the depth direction of the sample surface; rapid scanning electron microscopy (SEM) can achieve large-scale and high-throughput acquisition of sample characteristic maps. The sample transfer device is responsible for transferring the sample between the glow discharge sputtering source and the scanning electron microscope in an accurately positioning manner. The GPU computer workstation performs splicing, processing, recognition and quantitative distribution characterization on the acquired sample characteristic maps, and carries out three-dimensional reconstruction of the structure of the sample prepared by layer-by-layer sputtering.

公开(公告)号：US20220205922A1

公开(公告)日：2022-06-30

申请号：US17315235

申请日：2021-05-07

Applicant: NCS Testing Technology CO.,LTD

Inventor： Xing YU ,  Haizhou WANG ,  Xuejing SHEN ,  Xiaojia Li ,  Yifei ZHU ,  Weihao WAN ,  Yuhua LU ,  Hui WANG ,  Qun REN ,  Yongqing WANG ,  Zhenzhen WAN

IPC: G01N21/67 ,  H01J49/06 ,  C23C14/34 ,  H01J49/12 ,  H01J49/04

Abstract: An apparatus and a method for preparing glow discharge sputtering samples for materials microscopic characterization are provided. The apparatus includes a glow discharge sputtering unit, a glow discharge power supply, a gas circuit automatic control unit, a spectrometer, and a computer. The structure of the glow discharge sputtering unit is optimized to be more suitable for sample preparation by simulation. By adding a magnetic field to the glow discharge plasma, uniform sample sputtering is realized within a large size range of the sample surface. The spectrometer monitors multi-element signal in a depth direction of the sample sputtering, so that precise preparation of different layer microstructures is realized. In conjunction with the acquisition of the sample position marks and the precise spatial coordinates (x, y, z) information, the correspondence between the surface space coordinates and the microstructure of the sample is conveniently realized.