IMAGE ACQUISITION METHOD AND IMAGE ACQUISITION APPARATUS

    公开(公告)号:US20230009656A1

    公开(公告)日:2023-01-12

    申请号:US17805773

    申请日:2022-06-07

    Abstract: An image acquisition method includes storing a coefficient of a relational expression between a parameter corresponding to a light quantity incident on an imaging sensor including a photo sensor element and an output value of the imaging sensor in the case of the light incident on the imaging sensor which employs a reference image accumulation time, inputting a desired image accumulation time, and calculating a parameter for obtaining a desired output value of the imaging sensor by using a corrected relational expression obtained by correcting using an output value of the imaging sensor employing the desired image accumulation time in the case of the incident light quantity being zero, adjusting the light quantity incident on the imaging sensor to be a calculated parameter, and acquiring a target image by the imaging sensor on which an adjusted light quantity is incident, and outputting data of the acquired image.

    PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD

    公开(公告)号:US20230018318A1

    公开(公告)日:2023-01-19

    申请号:US17805759

    申请日:2022-06-07

    Abstract: A pattern inspection apparatus includes an illumination optical system to illuminate an inspection substrate on which a pattern is formed, an offset calculation circuit to calculate an offset amount which depends on an image accumulation time of each of a plurality of photo sensor elements arrayed two-dimensionally, a time delay integration (TDI) sensor to include the plurality of photo sensor elements, to acquire an image of the inspection substrate by receiving a transmitted light or a reflected light from the inspection substrate by the plurality of photo sensor elements, to correct, using the offset amount, a pixel value of optical image data of an acquired image, and to output the optical image data having been corrected, and a comparison circuit to compare an optical image formed by the optical image data output from the TDI sensor with a reference image.

    ADJUSTMENT METHOD OF INSPECTION APPARATUS FOCUS POSITION, AND PATTERN INSPECTION APPARATUS

    公开(公告)号:US20240280500A1

    公开(公告)日:2024-08-22

    申请号:US18436083

    申请日:2024-02-08

    Abstract: A method for adjusting a focus position of an inspection apparatus includes measuring, while varying a height position of a pattern forming surface of an evaluation substrate with thereon plural types of figure patterns, for each type of figure pattern, light amounts at front and back focus positions of a light transmitted through or reflected from the evaluation substrate irradiated with an inspection light, calculating an autofocus signal, for each type of figure pattern and for each height position of the pattern forming surface, by using the light amounts measured at the front and back focus positions, and specifying a value of an inspection autofocus signal such that a difference between autofocus signal values of plural type figure patterns calculated at the same height position of the pattern forming surface is equal to or less than a threshold value.

    MASK INSPECTION APPARATUS AND MASK INSPECTION METHOD
    4.
    发明申请
    MASK INSPECTION APPARATUS AND MASK INSPECTION METHOD 审中-公开
    屏蔽检查装置和屏蔽检查方法

    公开(公告)号:US20160267648A1

    公开(公告)日:2016-09-15

    申请号:US15064204

    申请日:2016-03-08

    Abstract: An inspection target is illuminated by an illumination optical unit using a light source. Optical image data of a pattern disposed in the inspection target is acquired by an imaging unit by causing light transmitted or reflected to be incident to a first and second area of a sensor. Reference image data is generated, corresponding to the optical image data, from design data of the pattern. The optical image data is corrected by obtaining a fluctuation of a gradation value of optical image data acquired using light incident to the second area, and correcting a gradation value of optical image data acquired using the light incident to the first area. A line width of the pattern of the corrected data, and a line width error which is a difference between the line widths of corrected data and reference image data are obtained by the line width error obtaining unit.

    Abstract translation: 使用光源的照明光学单元照射检查对象。 通过使透射或反射的光入射到传感器的第一和第二区域,由成像单元获取设置在检查对象物中的图案的光学图像数据。 从图案的设计数据生成对应于光学图像数据的参考图像数据。 通过获得使用入射到第二区域的光获取的光学图像数据的灰度值的波动来校正光学图像数据,并且校正使用入射到第一区域的光获取的光学图像数据的灰度值。 校正数据的图案的线宽以及作为校正数据和参考图像数据的线宽之间的差的线宽误差由线宽度误差获取单元获得。

    INSPECTION APPARATUS AND INSPECTION METHOD
    5.
    发明申请
    INSPECTION APPARATUS AND INSPECTION METHOD 有权
    检查装置和检查方法

    公开(公告)号:US20140307254A1

    公开(公告)日:2014-10-16

    申请号:US14251718

    申请日:2014-04-14

    Abstract: An inspection apparatus comprising, a Rochon prism configured to branch the light transmitted through a half-wave plate, a first sensor and a second sensor for acquiring an optical image of a pattern of the sample, the branched light being incident to the first sensor and the second sensor, a light quantity acquisition unit configured to acquire a light quantity ratio (1:A) of the second sensor to the first sensor using the optical image, and to obtain an angle θ of the half-wave plate such that the light quantity ratio becomes A:1, an angle controller configured to receive information on the angle θ from the light quantity acquisition unit to control an angle of the half-wave plate, a light source controller configured to control a light quantity of the light source such that each of the light quantity values becomes a target value.

    Abstract translation: 一种检查装置,包括:Rochon棱镜,被配置为分支透过半波片的光,第一传感器和第二传感器,用于获取样品图案的光学图像,所述分支光入射到第一传感器, 第二传感器,光量获取单元,被配置为使用光学图像获取第二传感器的光量比(1:A)到第一传感器,并获得角度和角度; 使得光量比成为A:1,角度控制器被配置为接收关于角度的信息; 从所述光量获取单元控制所述半波片的角度;光源控制器,被配置为控制所述光源的光量,使得每个所述光量值成为目标值。

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