公开(公告)号：WO2014097262A1

公开(公告)日：2014-06-26

申请号：PCT/IB2013/061223

申请日：2013-12-20

Applicant: ORGANIC SPINTRONICS S.R.L.

Inventor： YARMOLICH, Dmitry ,  TALIANI, Carlo

IPC: H01J37/077 ,  H01J37/305

CPC classification number: C23C16/515 ,  C23C16/487 ,  H01J3/025 ,  H01J37/077 ,  H01J37/30 ,  H01J37/3053 ,  H01J37/32532 ,  H01J2237/06375 ,  H01J2237/151 ,  H01J2237/3132

Abstract: A pulsed plasma deposition device, comprising an apparatus for generating a beam of electrons (3), a target (4) and a substrate (6), the apparatus (3) being suitable for generating a pulsed beam of electrons directed towards said target (4) to determine the ablation of the material of said target (4) in the form of a plasma plume (19) directed towards said substrate (6); the device comprises a transportation and focussing group (13) of the beam of electrons towards said target (4), arranged between said apparatus (3) and said target (4) and comprising a transportation cone (14), the transportation and focussing group (13) also comprising a focussing electrode (15) directly connected to the transportation cone (14) and shaped substantially like a loop; the axis of symmetry (16) of the focussing electrode (15) is perpendicular, or substantially perpendicular, to the surface of the target (4).

Abstract translation: 一种脉冲等离子体沉积装置，包括用于产生电子束（3），靶（4）和衬底（6）的装置，所述装置（3）适于产生指向所述目标的脉冲电子束（ 4）确定所述靶（4）的材料以等离子体羽流（19）的形式消融，所述等离子体羽流指向所述衬底（6）; 该装置包括位于所述设备（3）和所述目标（4）之间并且包括输送锥体（14）的运送和聚焦组（13）的电子束朝向所述目标（4），所述输送和聚焦组 （13）还包括直接连接到输送锥体（14）并且基本上形成环状的聚焦电极（15）; 聚焦电极（15）的对称轴（16）垂直于或基本垂直于靶（4）的表面。

公开(公告)号：EP2936538A1

公开(公告)日：2015-10-28

申请号：EP13826886.7

申请日：2013-12-20

Applicant: Organic Spintronics S.R.L.

Inventor： YARMOLICH, Dmitry ,  TALIANI, Carlo

IPC: H01J37/077 ,  H01J37/305

CPC classification number: C23C16/515 ,  C23C16/487 ,  H01J3/025 ,  H01J37/077 ,  H01J37/30 ,  H01J37/3053 ,  H01J37/32532 ,  H01J2237/06375 ,  H01J2237/151 ,  H01J2237/3132

Abstract: A pulsed plasma deposition device, comprising an apparatus for generating a beam of electrons (3), a target (4) and a substrate (6), the apparatus (3) being suitable for generating a pulsed beam of electrons directed towards said target (4) to determine the ablation of the material of said target (4) in the form of a plasma plume (19) directed towards said substrate (6); the device comprises a transportation and focussing group (13) of the beam of electrons towards said target (4), arranged between said apparatus (3) and said target (4) and comprising a transportation cone (14), the transportation and focussing group (13) also comprising a focussing electrode (15) directly connected to the transportation cone (14) and shaped substantially like a loop; the axis of symmetry (16) of the focussing electrode (15) is perpendicular, or substantially perpendicular, to the surface of the target (4).

公开(公告)号：EP2936538B1

公开(公告)日：2017-01-11

申请号：EP13826886.7

申请日：2013-12-20

Applicant: Organic Spintronics S.R.L.

Inventor： YARMOLICH, Dmitry ,  TALIANI, Carlo

IPC: H01J37/077 ,  H01J37/305 ,  H01J3/02

CPC classification number: C23C16/515 ,  C23C16/487 ,  H01J3/025 ,  H01J37/077 ,  H01J37/30 ,  H01J37/3053 ,  H01J37/32532 ,  H01J2237/06375 ,  H01J2237/151 ,  H01J2237/3132