Semiconductor substrate that emits emissive light for surface-emitting laser, and its manufacturing method
    2.
    发明专利
    Semiconductor substrate that emits emissive light for surface-emitting laser, and its manufacturing method 审中-公开
    用于表面发射激光的EMIIS发光二极管及其制造方法

    公开(公告)号:JP2006074051A

    公开(公告)日:2006-03-16

    申请号:JP2005251976

    申请日:2005-08-31

    CPC classification number: H01S5/14 H01S5/18308 H01S5/2072

    Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor substrate for a surface-emitting laser with improved high output and current supply, a surface-emitting laser, and a method for manufacturing the semiconductor substrate, at a low technical cost.
    SOLUTION: A semiconductor substrate (1), comprising an active layer (4) for causing emission light to emerge and a current supply layer (6) having a current block region (12) and a current pass region (13) and emitting emission light, having the vertical emission direction, is provided for a surface-emitting laser equipped equipped with an external resonator, and the external resonator has a predetermined resonator volume (14) that overlaps with the current passing region (13).
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题:以技术上的低成本提供具有改进的高输出和电流供应的表面发射激光器的半导体衬底,表面发射激光器和半导体衬底的制造方法。 解决方案:一种半导体衬底(1),包括用于引发发射光的有源层(4)和具有电流阻挡区域(12)和电流通过区域(13)的电流供应层(6),以及 具有垂直发射方向的发射发射光被提供给配备有外部谐振器的表面发射激光器,并且外部谐振器具有与电流通过区域(13)重叠的预定谐振器体积(14)。 版权所有(C)2006,JPO&NCIPI

    Opto-electronic chip
    3.
    发明专利
    Opto-electronic chip 审中-公开
    OPTO电子芯片

    公开(公告)号:JP2007027728A

    公开(公告)日:2007-02-01

    申请号:JP2006190740

    申请日:2006-07-11

    Abstract: PROBLEM TO BE SOLVED: To provide an opto-electronic chip having extra-high irradiating output coupling efficiency, and to provide the opto-electronic chip in which the proportion of output coupling to a specific spacial angle region out of generated electromagnetic radiation is especially large. SOLUTION: The opto-electronic chip is provided with a semiconductor body having a radiating/emitting region and a partial region in which the surface of the semiconductor body is curved toward a carrier. The length of the lateral direction of the radiating/emitting region is shorter than the length of the lateral direction of the partial region. The problem is solved by providing the opto-electronic chip. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题:提供具有超高照射输出耦合效率的光电芯片,并提供光电芯片,其中输出耦合到特定空间角区域的比例在产生的电磁辐射之外 特别大。 解决方案:光电芯片设置有具有辐射/发射区域和半导体主体的表面朝向载体弯曲的部分区域的半导体本体。 辐射/发射区域的横向长度比部分区域的横向长度短。 通过提供光电芯片来解决问题。 版权所有(C)2007,JPO&INPIT

    Light emitting semiconductor chip and beam shaping element
    7.
    发明专利
    Light emitting semiconductor chip and beam shaping element 审中-公开
    发光半导体芯片和光束形状元件

    公开(公告)号:JP2006019745A

    公开(公告)日:2006-01-19

    申请号:JP2005192973

    申请日:2005-06-30

    Inventor: STREUBEL KLAUS

    CPC classification number: H01L33/60 G02B19/0028 G02B19/0061 G02B19/0095

    Abstract: PROBLEM TO BE SOLVED: To have reduced loss in the case of radiation emission or radiation-input coupling and comparatively advanced stability for ultraviolet radiation to be had by improving a beam shaping element, in a light emitting semiconductor chip 2 provided with the beam shaping element.
    SOLUTION: The beam shaping element comprises an hollow body 1 provided with a light emission hole 7 and a light entrance hole 8 opposed to the light emission hole, and a semiconductor chip is in contact with the light entrance hole of the hollow body 1 or penetrates into the hollow body through the light entrance hole. The light emitting semiconductor chip is constituted so that the semiconductor chip emits electromagnetic radiation 3 into the interior of the hollow body, and at least a part of electromagnetic radiation reflects on a wall section 6 of the hollow body toward the light emission hole.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题:为了在辐射发射或辐射输入耦合的情况下具有减小的损耗,并且通过改进光束成形元件可以获得相对较高的紫外线辐射稳定性,在设置有光束成形元件的发光半导体芯片2中 光束成形元件。 光束成形元件包括具有发光孔7的空心体1和与发光孔相对的光入射孔8,半导体芯片与中空体的光入射孔接触 1或通过光入射孔渗入中空体。 发光半导体芯片构成为使得半导体芯片将电磁辐射3发射到中空体的内部,并且电磁辐射的至少一部分在中空体的壁部6上朝向发光孔反射。 版权所有(C)2006,JPO&NCIPI

    Radiation emission element
    8.
    发明专利
    Radiation emission element 审中-公开
    辐射排放元素

    公开(公告)号:JP2008047906A

    公开(公告)日:2008-02-28

    申请号:JP2007209632

    申请日:2007-08-10

    CPC classification number: H01L33/44 G02F1/13362 H01L33/46 H01L33/58

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation emission element which can actualize relatively high luminance in a desired spatial direction, in a desired polarization direction or at a desired wavelength. SOLUTION: The radiation emission element according to the present invention is based on a semiconductor material and comprises a layer stack having an active layer sequence for producing a radiation emission element and a filter element placed at a rear side of the active layer sequence as seen from a radiation direction, and is configured in such a manner that the filter element emits a first emission component and reflects a second emission component within the layer stack, the second reflection component, after being reflected at the filter element, is subjected to deflection process or absorption emission process, and the radiation deflected or emitted is supposed to come into the filter element again. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种可以在期望的空间方向上,在期望的偏振方向或期望的波长上实现相对高的亮度的辐射发射元件。 解决方案:根据本发明的辐射发射元件基于半导体材料并且包括具有用于产生辐射发射元件的有源层序列和放置在有源层序列的后侧的滤波器元件的层堆叠 从辐射方向看,并且被配置为使得过滤元件发射第一发射分量并且反射层堆内的第二发射分量,第二反射分量在被滤波元件反射之后经受 偏转过程或吸收发射过程,并且偏转或发射的辐射应该再次进入过滤元件。 版权所有(C)2008,JPO&INPIT

    FABRICATION METHOD OF OPTICALLY TRANSPARENT SUBSTRATE AND FABRICATION METHOD OF LIGHT EMITTING SEMICONDUCTOR CHIP

    公开(公告)号:JP2001244499A

    公开(公告)日:2001-09-07

    申请号:JP2001045638

    申请日:2001-02-21

    Inventor: STREUBEL KLAUS

    Abstract: PROBLEM TO BE SOLVED: To provide a fabrication method of an optically transparent substrate on which a semiconductor structure can be built up by epitaxial growth. SOLUTION: This fabrication method of an optically transparent substrate is such that a substrate layer (2) is built up on a substrate (1), which is subjected to lattice-matching, by epitaxial method, an optically transparent layer (3) is bonded to the substrate layer (2) on the side opposite to the substrate (1) by wafer bonding and then the lattice-matched substrate (1) is removed from the bonded unit of the substrate layer (2) and the transparent layer (3).

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