SUBSTRATES FOR THE GROWTH OF 3C-SILICON CARBIDE
    1.
    发明公开
    SUBSTRATES FOR THE GROWTH OF 3C-SILICON CARBIDE 失效
    衬底生长3-C碳化硅。

    公开(公告)号:EP0672298A1

    公开(公告)日:1995-09-20

    申请号:EP94903525.0

    申请日:1993-12-07

    CPC classification number: C30B25/02 C30B29/36 C30B29/38 Y10T428/24942

    Abstract: A substrate for the growth of monocrystalline beta -SiC is formed by providing a body of monocrystalline hexagonal material having a planar surface with a lattice parameter that is within +/-5% of the lattice parameter of 6H alpha -SiC in the basal plane and growing a body of monocrystalline cubic material on the surface to provide a planar cubic material surface that is without grain boundaries, subgrain boundaries, double positioning boundaries, and pits. The cubic material, for example TiC, ZrC, HfC, or TiN, has a rock salt structure and a lattice parameter within +/-5% of the lattice parameter of beta -SiC. Monocrystalline beta -SiC can be nucleated and grown on the surface of the cubic material.

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