MEMS DEVICE AND METHOD FOR MANUFACTURING THE SAME
    1.
    发明申请
    MEMS DEVICE AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    MEMS器件及其制造方法

    公开(公告)号:WO2010029656A3

    公开(公告)日:2010-06-24

    申请号:PCT/JP2009001970

    申请日:2009-04-30

    Abstract: A MEMS device, including: a substrate (101) having a first principal plane and a second principal plane opposite to the first principal plane; a through hole (110) formed in the substrate (101); and a vibrating film (105) formed over the first principal plane so as to cover the through hole (110). The first principal plane and the second principal plane are both a (110) crystal face; and the through hole (110) has a substantially rhombic shape on the second principal plane.

    Abstract translation: 一种MEMS器件,包括:具有第一主平面和与第一主平面相对的第二主平面的衬底(101); 形成在所述基板(101)中的通孔(110); 以及形成在所述第一主平面上以覆盖所述通孔(110)的振动膜(105)。 第一主平面和第二主平面都是(110)晶面; 并且所述通孔(110)在所述第二主平面上具有大致菱形。

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