ELECTRON-BEAM DEVICE AND SEMICONDUCTOR DEVICE FOR USE IN SUCH AN ELECTRON-BEAM DEVICE

    公开(公告)号:CA1249012A

    公开(公告)日:1989-01-17

    申请号:CA495932

    申请日:1985-11-21

    Applicant: PHILIPS NV

    Abstract: 19 A device for recording or displaying images or for electron lithographic or electron microscopic uses, comprising in an evacuated envelope (1) a target (7) on which at least one electron beam (6) is focussed. This beam is generated by means of a semiconductor device (10) which comprises an electrically insulating layer (42) having an aperture (38) through which passes the beam. The layer carries at least four beam-forming electrodes (43 up to and including 50) which are situated at regular intervals around the aperture (38), each of which electrodes has such a potential that an n-pole field or a combination of n-pole fields is generated in which n is an even integer greater than or equal to 4 and smaller than or equal to 16. A suitable choice of the n-pole field will make it possible to impart substantially any desired shape to the beam (6) and thus the focus on the target.

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