公开(公告)号：US3600330A

公开(公告)日：1971-08-17

申请号：US3600330D

申请日：1967-01-03

Applicant: PHOTOCIRCUITS DIVISION OF KOLI

Inventor： SCHNEBLE FREDERICK W JR ,  LEECH EDWARD J ,  POLICHETTE JOSEPH

IPC: B01J37/00 ,  C23C18/16 ,  C23C18/20 ,  C23C18/30 ,  C23C18/31 ,  C23C18/34 ,  C23C18/40 ,  C23C18/44 ,  D06Q1/04 ,  H01B3/30 ,  H05K1/03 ,  H05K3/10 ,  H05K3/18 ,  H05K3/42 ,  H05K3/46 ,  C23C3/00

CPC classification number: H05K3/427 ,  B01J37/00 ,  C23C18/1608 ,  C23C18/2086 ,  C23C18/30 ,  C23C18/40 ,  D06Q1/04 ,  H01B3/30 ,  H05K1/0373 ,  H05K3/108 ,  H05K3/181 ,  H05K3/422 ,  H05K3/428 ,  H05K3/4644 ,  H05K3/4661 ,  H05K2201/0209 ,  H05K2201/0236 ,  H05K2203/122

Abstract: THERE ARE PROVIDED COMPOSITIONS TO RENDER INSULTING SUBSTRATES CATALYTIC TO ELECTROLESS METAL DEPOSITION COMPRISING MATERIALS, E.G., SOLID AGENTS, HAVING DEPOSITED THEREON A CATIONIC WETTING AGENT IN COMBINATION WITH AN ELEMENTAL FORM OF A METAL FROM GROUPS I-B AND VIII OF THE PERIODIC TABLE OF ELEMENTS, INCLUDING MIXTURES OF SUCH METALS.