公开(公告)号：AU2002366162A1

公开(公告)日：2003-06-10

申请号：AU2002366162

申请日：2002-11-18

Applicant: PIXELLIGENT TECHNOLOGIES LLC

Inventor： CASE ANDREW ,  COOPER GREGORY D ,  FLEET ERIN

IPC: G03F7/20 ,  G03B27/42 ,  G03B27/54 ,  G03B27/32

Abstract: Method and apparatus for exposing photo resists using programmable masks increases imaging resolution to provide fully dense integrated circuit patterns made of very small features on photoresist-coated silicon wafers by optical lithography. Small features are created by means of overlap exposure with either programmable or conventional masks. Blocking photoresists responding differently to two different wavelengths of light, two-color photoresists requiring two wavelengths of light to change solubility, and two-photon photoresists which change solubility only by absorbing two photons at a time may be used.