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公开(公告)号：AU2003297714A1
公开(公告)日：2004-06-30
申请号：AU2003297714
申请日：2003-12-09
Applicant: PIXELLIGENT TECHNOLOGIES LLC , FLEET ERIN F , GONEN SERPIL , COOPER GREGORY D
Inventor： FLEET ERIN F , GONEN SERPIL , COOPER GREGORY D , CHEN ZHIYUN
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公开(公告)号：AU2002366162A1
公开(公告)日：2003-06-10
申请号：AU2002366162
申请日：2002-11-18
Applicant: PIXELLIGENT TECHNOLOGIES LLC
Inventor： CASE ANDREW , COOPER GREGORY D , FLEET ERIN
Abstract: Method and apparatus for exposing photo resists using programmable masks increases imaging resolution to provide fully dense integrated circuit patterns made of very small features on photoresist-coated silicon wafers by optical lithography. Small features are created by means of overlap exposure with either programmable or conventional masks. Blocking photoresists responding differently to two different wavelengths of light, two-color photoresists requiring two wavelengths of light to change solubility, and two-photon photoresists which change solubility only by absorbing two photons at a time may be used.
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公开(公告)号：WO2020106884A1
公开(公告)日：2020-05-28
申请号：PCT/US2019/062476
申请日：2019-11-20
Applicant: PIXELLIGENT TECHNOLOGIES LLC
Inventor： GUSCHL, Peter, Christopher , DOLGIN, James , MORGENSTERN, Joseph, Thomas , SWISHER, Robert
IPC: C08K9/04 , C08K9/06 , C08K3/22 , C08F220/18 , C08F220/26 , C08F2/50 , C08F2/44 , C08J5/18 , C08K5/00 , C08L101/02
Abstract: The present disclosure provides a high-refractive index acrylic formulation embedded with sub-30 nm metal oxide nanocrystals. The formulation is solvent-free, low-viscosity, inkjettable (among other film deposition techniques) and produces high-refractive index, high transparency nanocomposites for a variety of optical applications including OLED lighting and display applications
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公开(公告)号：WO2012058271A2
公开(公告)日：2012-05-03
申请号：PCT/US2011/057822
申请日：2011-10-26
Applicant: PIXELLIGENT TECHNOLOGIES, LLC , GONEN WILLIAMS, Zehra, Serpil , WANG, Yijun , WIACEK, Robert, J. , BAI, Xia , GOU, Linfeng , THOMAS, Selina, I. , XU, Wei , XU, Jun
Inventor： GONEN WILLIAMS, Zehra, Serpil , WANG, Yijun , WIACEK, Robert, J. , BAI, Xia , GOU, Linfeng , THOMAS, Selina, I. , XU, Wei , XU, Jun
CPC classification number: C30B29/16 , B82Y30/00 , B82Y40/00 , C01G25/006 , C01G25/02 , C01G27/006 , C01P2006/40 , C01P2006/60 , C30B7/10 , C30B7/14 , C30B29/22 , C30B33/00 , H01B1/00 , H01L21/02554 , H01L21/02601 , H01L21/02628 , H01L51/0094 , Y10S977/774 , Y10S977/896 , Y10S977/932
Abstract: Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1 -10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films.
Abstract translation: 描述了在溶剂和其他介质中制备半导体纳米晶体及其分散体。 本文所述的纳米晶体具有小的（1-10nm）粒径和最小的聚集并且可以以高收率合成。 合成的纳米晶体上的封端剂以及经历了帽子交换反应的纳米晶体导致在极性和非极性溶剂中形成稳定的悬浮液，这可能导致形成高质量的纳米复合材料膜。
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5.发明申请PROGRAMMABLE PHOTOLITHOGRAPHIC MASK BASED ON NANO-SIZED SEMICONDUCTOR PARTICLES 审中-公开基于纳米尺寸半导体颗粒的可编程光刻掩模
公开(公告)号：WO2004053938A3
公开(公告)日：2005-04-28
申请号：PCT/US0338894
申请日：2003-12-09
Applicant: PIXELLIGENT TECHNOLOGIES LLC , CHEN ZHIYUN , FLEET ERIN F , GONEN SERPIL , COOPER GREGORY D
Inventor： CHEN ZHIYUN , FLEET ERIN F , GONEN SERPIL , COOPER GREGORY D
CPC classification number: G03F7/70383 , B82Y20/00 , G02F1/0126 , G02F1/015 , G02F1/01716 , G02F2202/36 , G02F2203/12 , G03F7/70291 , Y10S430/146 , Y10S977/932 , Y10T428/24802 , Y10T428/24893
Abstract: Semiconductor nano-particles, due to their specific physical properties, can be used as optical modulator and reversible photo-bleachable materials for a wide spectrum, from far infrared to deep U.V. In this patent, nano-particles are provided with control circuitry to form a programmable mask. The optical characteristics of the nano-particles change to provide patterned light. Such patterned light can be used for example to expose a photoresist on a semiconductor wafer for photolithography. Other applications include, reversible contrast enhancement layer (R-CEL) in optical lithography, lithography mask inspection and writing and optical storage technologies.
Abstract translation: 半导体纳米颗粒由于其特定的物理特性，可用作光谱调制器和可逆光可漂白材料，用于广谱，从远红外到深紫外。 在该专利中，纳米颗粒设置有控制电路以形成可编程掩模。 纳米颗粒的光学特性改变以提供图案化的光。 这种图案化的光可以用于例如在半导体晶片上曝光用于光刻的光致抗蚀剂。 其他应用包括光学光刻中的可逆对比度增强层（R-CEL），光刻掩模检查和写入以及光存储技术。
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Patent Agency Ranking
公开(公告)号：WO2017023642A1
公开(公告)日：2017-02-09
申请号：PCT/US2016/044243
申请日：2016-07-27
Applicant: PIXELLIGENT TECHNOLOGIES LLC
Inventor： MONICKAM, Selina , PETERS, Darryl , COOPER, Gregory , CHEN, Zhiyun
CPC classification number: C08K9/06 , C08K3/22 , C08K9/04 , C08K2003/2244 , C08K2201/011 , C09D5/00 , C09D7/62 , C08L33/08
Abstract: The present disclosure provides a high refractive index acrylic formulation embedded with sub-10 nm metal oxide nanocrystals. The formulation is ideal for high refractive index, high transparency coating for a variety of optical applications including OLED lighting.
Abstract translation: 本公开提供了嵌入次10nm金属氧化物纳米晶体的高折射率丙烯酸制剂。 该配方适用于各种光学应用（包括OLED照明）的高折射率，高透明度涂层。
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公开(公告)号：WO2015069384A2
公开(公告)日：2015-05-14
申请号：PCT/US2014057035
申请日：2014-09-23
Applicant: PIXELLIGENT TECHNOLOGIES LLC
Inventor： XU WEI , BAI XIA , BAHADUR MANEESH , GOU LINFENG , ZHENG LEI , CRINITI JAMES , COOPER GREGORY , WILLIAMS SERPIL GONEN
CPC classification number: H01L33/502 , C09D183/06 , H01L27/322 , H01L33/56 , H01L51/5253 , H01L2251/5369
Abstract: The present disclosure provides nanocrystal(s) containing silicone capping agent(s). Dispersions containing the nanocrystal(s) and at least one of silicone monomer(s), silicone pre-polymer(s), and silicone polymer(s), and optionally additionally containing a solvent are also described. Cured dispersions, compositions of nanocrystal(s) and LEDs and related structures containing the composition(s) are provided in the present disclosure.
Abstract translation: 本公开提供了含有硅酮封端剂的纳米晶体。 还描述了含有纳米晶体和硅氧烷单体，硅氧烷预聚物和有机硅聚合物中的至少一种的分散体，以及任选另外含有溶剂。 在本公开内容中提供了固化分散体，纳米晶体组合物和LED以及含有组合物的相关结构。
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公开(公告)号：WO2011133228A2
公开(公告)日：2011-10-27
申请号：PCT/US2011/000724
申请日：2011-04-25
Applicant: PIXELLIGENT TECHNOLOGIES, LLC , GONEN WILLIAMS, Zehra, Serpil , WANG, Yijun , WIACEK, Robert, J. , BAI, Xia , GOU, Linfeng , THOMAS, Selina, I. , XU, Wei , XU, Jun , PATEL, Rakesh
Inventor： GONEN WILLIAMS, Zehra, Serpil , WANG, Yijun , WIACEK, Robert, J. , BAI, Xia , GOU, Linfeng , THOMAS, Selina, I. , XU, Wei , XU, Jun , PATEL, Rakesh
CPC classification number: C30B29/16 , B82Y30/00 , B82Y40/00 , C07F7/1836 , C07F7/28 , C30B7/10 , C30B7/14 , C30B29/32 , H01B1/14 , H01B1/20 , H01B1/22 , H01L21/02565 , H01L21/02601 , H01L21/02628 , H01L51/005 , H01L51/0094 , Y10S977/774 , Y10S977/896 , Y10S977/932
Abstract: Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1 -10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films.
Abstract translation: 描述了在溶剂和其它介质中制备半导体纳米晶体及其分散体。 本文所述的纳米晶体具有小的（1-10nm）粒度，具有最小的聚集，并且可以高产率合成。 在合成后的纳米晶体上的封端剂以及经历了帽交换反应的纳米晶体导致在极性和非极性溶剂中形成稳定的悬浮液，这可能导致形成高质量的纳米复合膜。
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9.发明申请
公开(公告)号：WO2005029180A3
公开(公告)日：2006-02-02
申请号：PCT/US2004006443
申请日：2004-03-04
Applicant: PIXELLIGENT TECHNOLOGIES LLC , CHEN ZHIYUN , FLEET ERIN F , COOPER GREGORY
Inventor： CHEN ZHIYUN , FLEET ERIN F , COOPER GREGORY
IPC: G03F20060101 , G03F1/00 , H01L21/027 , G03F7/00 , G03F7/04 , G03F7/26 , G03F9/00
CPC classification number: G03F7/2041 , B82Y30/00 , G03F1/62 , G03F7/004 , G03F7/091 , G03F7/2002
Abstract: Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing mateirals as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists are described.
Abstract translation: 半导体纳米尺寸颗粒具有独特的光学性质，使其成为UV光刻技术中各种应用的理想选择。 在该专利中，描述了包括使用半导体纳米尺寸颗粒或半导体纳米尺寸颗粒在浸没式光刻中作为高折射介质的半导体纳米尺寸颗粒，作为光学中的抗反射涂层，光刻中的防护薄膜和UV光致抗蚀剂中的敏化剂 。
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10.发明申请
公开(公告)号：WO2003044597A1
公开(公告)日：2003-05-30
申请号：PCT/US2002/036942
申请日：2002-11-18
Applicant: PIXELLIGENT TECHNOLOGIES LLC , CASE, Andrew , COOPER, Gregory, D. , FLEET, Erin
Inventor： CASE, Andrew , COOPER, Gregory, D. , FLEET, Erin
IPC: G03B27/42
CPC classification number: G03F7/70466 , G03F7/70291
Abstract: Method for exposing photo resists using programmable masks (74) increases imaging resolution to provide fully dense integrated circuit patterns made of very small features on photoresist-coated silicon wafers by optical lithography. Small features are created by means of overlap exposure (52) with either programmable or conventional masks. Blocking photoresists responding differently to two different wavelengths or light (80, 82), two-color photoresists requiring two wavelengths of light to change solubility, and two-photon photoresists which change solubility only by absorbing two photons at a time may be used.
Abstract translation: 使用可编程掩模（74）曝光光刻胶的方法提高了成像分辨率，以通过光学平版印刷技术在光致抗蚀剂涂覆的硅晶片上提供由非常小的特征制成的全密集的集成电路图案。 通过与可编程或常规掩模的重叠曝光（52）创建小特征。 可以使用不同于两种不同波长或光（80,82）的阻挡光刻胶，需要两个波长的光来改变溶解度的双色光致抗蚀剂，并且可以一次仅通过吸收两个光子来改变溶解度的双光子光致抗蚀剂。
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