公开(公告)号：US20180144913A1

公开(公告)日：2018-05-24

申请号：US15571600

申请日：2016-04-28

Applicant: PLANSEE SE

Inventor： ANDRE DRONHOFER ,  CHRISTIAN LINKE ,  ELISABETH EIDENBERGER

IPC: H01J37/34

CPC classification number: H01J37/3435 ,  H01J37/3408 ,  H01J37/3429 ,  H01J37/3488

Abstract: A target for a cathode sputtering system has a tubular target body made of a sputtering material and at least one connector piece, which is connected to the target body and projects from the target body, for attaching the target body to the cathode sputtering system. The target body is connected to the at least one connector piece in a vacuum-tight manner and the two are rotationally fixed relative to one another. At least one damper element is provided between the at least one connector piece and the target body.