公开(公告)号：WO2006113955A3

公开(公告)日：2007-02-22

申请号：PCT/AT2006000162

申请日：2006-04-24

Applicant: PLANSEE SE ,  SCHINTLMEISTER ARNO ,  WILHARTITZ PETER

Inventor： SCHINTLMEISTER ARNO ,  WILHARTITZ PETER

IPC: C04B35/58

CPC classification number: H01L21/28568 ,  C04B35/58007 ,  C04B35/645 ,  C04B2235/404 ,  C04B2235/80 ,  C23C14/3414

Abstract: The invention relates to a method for producing a TaNx diffusion barrier layer with 0.5 99 of the theoretical density is used as evaporator source. Part of the reactive gas in the process gas is reduced to a minimum by using ceramic tantalum nitride or tantalum nitride-tantalum cement evaporator sources. One part of

Abstract translation: 本发明涉及一种用于制备TANX扩散阻挡层的0.5 99％，使用具有一个密度钽金属陶瓷。 通过使用陶瓷氮化钽或氮化钽的 - 钽金属陶瓷蒸发源靶向反应性气体的比例可降低到工艺气体中最小。 <20体积％反应性气体组分的分数通常为足以补偿由于在所述层材料的蒸发器和ungs-冷凝过程的化合物的气态组分的泵送损失。

公开(公告)号：HRP20020100B1

公开(公告)日：2010-11-30

申请号：HRP20020100

申请日：2002-02-01

Applicant: PLANSEE SE

Inventor： WILHARTITZ PETER ,  SCHOENAUER STEFAN ,  POLCIK PETER

IPC: B22F3/17 ,  C23C14/34 ,  B22F3/14 ,  B22F3/20 ,  B22F7/06 ,  C22C14/00

Abstract: The invention relates to a process for manufacturing an evaporation source for physical vapor deposition. The evaporation source is formed of the actual sputtering target with an aluminum component and one or more further components as well as of a backing plate made from a material having better thermal conductivity than the target. The backing plate made of a powdery starting material is pressed, together with the powdery components of the sputtering target, into sandwiched powder fractions and then formed.

公开(公告)号：RS49852B

公开(公告)日：2008-08-07

申请号：YUP44502

申请日：2001-11-07

Applicant: PLANSEE SE

Inventor： WILHARTITZ PETER ,  LOHNERT WOLFGANG ,  SCHOENAUER STEFAN ,  POLCIK PETER

IPC: B22F3/17 ,  C23C14/34 ,  B22F3/14 ,  B22F3/20 ,  B22F7/06 ,  C22C14/00

Abstract: Postupak za izradu jednog izvora isparavanjaj za fizičko razdvajanje pare, koji se sastoji od jednog bloka, koji pored jedne ili više komponenata sadrži jednu aluminijumsku komponentu i takodje jednu zadnju ploču povezanu sa blokom, koja je izradjena od materijala bolje toplotne provodljivosti od bloka, pri čemu se blok izradjuje hladnim presovanjem mešavine pojedinačnih komponenata u obliku praha, a potom se uz tečenje obradjuje oblikovanjem na temperaturi ispod tačke topljenja pojedinačnih komponenata do dostizanja gustine od najmanje 98% teoretske gustine, naznačen time, što se zadnja ploča, koja se takodje sastoji od praškastog polaznog materijala spaja zajedno sa komponentama blokla i to slaganjem slojeva jedne praškaste frakcije preko druge, a zatim presuje i dalje obradjuje.

公开(公告)号：MY128636A

公开(公告)日：2007-02-28

申请号：MYPI20015103

申请日：2001-11-06

Applicant: PLANSEE SE

Inventor： WILHARTITZ PETER ,  SCHOENAUER STEFAN ,  POLCIK PETER

IPC: B22F3/17 ,  C23C14/34 ,  B22F3/14 ,  B22F3/20 ,  B22F7/06 ,  C22C14/00

Abstract: THE INVENTION RELATES TO A PROCESS FOR MANUFACTURING AN EVAPORATION SOURCE FOR PHYSICAL VAPOUR DEPOSITION. THE EVAPORATION SOURCE COMPRISES THE ACTUAL SPUTTERING TARGET WITH AN ALUMINIUM COMPONENT AND ONE OR MORE FURTHER COMPONENTS AS WELL AS A BACKING PLATE MADE FROM A MATERIAL HAVING BETTER THERMAL CONDUCTIVITY THAN THE TARGET.ACCORDING TO THE INVENTION THE BACKING PLATE MADE OF A POWDERY STARTING MATERIAL IS PRESSED, TOGETHER WITH POWDERY COMPONENTS OF THE SPUTTERING TARGET, INTO SANDWICHED POWDER FRACTIONS AND THEN FORMED.

公开(公告)号：HU225577B1

公开(公告)日：2007-03-28

申请号：HU0301848

申请日：2001-11-07

Applicant: PLANSEE SE

Inventor： WILHARTITZ PETER ,  SCHOENAUER STEFAN ,  POLCIK PETER

IPC: B22F3/17 ,  C23C14/34 ,  B22F3/14 ,  B22F3/20 ,  B22F7/06 ,  C22C14/00

Abstract: The invention relates to a process for manufacturing an evaporation source for physical vapor deposition. The evaporation source is formed of the actual sputtering target with an aluminum component and one or more further components as well as of a backing plate made from a material having better thermal conductivity than the target. The backing plate made of a powdery starting material is pressed, together with the powdery components of the sputtering target, into sandwiched powder fractions and then formed.

公开(公告)号：PL199272B1

公开(公告)日：2008-09-30

申请号：PL35511501

申请日：2001-11-07

Applicant: PLANSEE SE

Inventor： WILHARTITZ PETER ,  SCHOENAUER STEFAN ,  POLCIK PETER

IPC: B22F3/17 ,  B22F7/06 ,  B22F3/14 ,  B22F3/20 ,  C22C14/00 ,  C23C14/34

公开(公告)号：CZ298911B6

公开(公告)日：2008-03-12

申请号：CZ2002669

申请日：2001-11-07

Applicant: PLANSEE SE

Inventor： WILHARTITZ PETER ,  SCHOENAUER STEFAN ,  POLCIK PETER

IPC: B22F3/17 ,  C23C14/34 ,  B22F3/14 ,  B22F3/20 ,  B22F7/02 ,  B22F7/06 ,  C22C14/00

Abstract: Vynález se týká zpusobu výroby zdroje odparování pro fyzikální nanášení parami. Zdroj odparování sestává z vlastní rozprašovací anody s hliníkovou složkou a z jedné nebo více dalších složek, jakož i ze zadní desky z materiálu lepší tepelné vodivostinež anoda. Podle vynálezu se zadní deska z práškovitého výchozího materiálu spolecne s práškovitýmisložkami rozprašovací anody v nad sebou navrstvených práškových frakcích lisuje a následne pretvárí.