1.
    发明专利
    未知

    公开(公告)号:BRPI0617249A2

    公开(公告)日:2011-07-19

    申请号:BRPI0617249

    申请日:2006-10-05

    Applicant: PLANSEE SE

    Abstract: A tubular target formed of molybdenum or a molybdenum alloy has an oxygen content of less than 50 μg/g, a density of greater than 99% of the theoretical density, and an average grain size of less than 100 μm. The molybdenum or molybdenum alloy tube may be produced by extrusion. In one embodiment, the molybdenum tube has a backing tube of titanium or titanium alloy. In an embodiment, the molybdenum tube has a varying wall thickness with an increase towards its ends.

    BLANCO TUBULAR.
    3.
    发明专利

    公开(公告)号:ES2356773T3

    公开(公告)日:2011-04-13

    申请号:ES06790256

    申请日:2006-10-05

    Applicant: PLANSEE SE

    Abstract: Procedimiento para la fabricación de un blanco tubular que comprende un tubo de molibdeno o una aleación de molibdeno con un contenido de oxígeno inferior a 50 µg/g, una densidad superior al 99% de la densidad teórica y un tamaño de grano medio transversal a la dirección axial inferior a 100 µm, así como un tubo de apoyo de un material no magnético, caracterizado porque comprende al menos los siguientes pasos de fabricación: - fabricación de un polvo metálico de molibdeno o una aleación de molibdeno con un tamaño de partícula medio según Fischer de 0,5 a 10 µm; - fabricación de una pieza en verde en forma de una pieza en bruto para tubo mediante prensado isostático en frío del polvo metálico en una matriz flexible utilizando un núcleo a una presión p, donde 100 MPa

    METHOD FOR PRODUCING AN EVAPORATION SOURCE

    公开(公告)号:HRP20020100B1

    公开(公告)日:2010-11-30

    申请号:HRP20020100

    申请日:2002-02-01

    Applicant: PLANSEE SE

    Abstract: The invention relates to a process for manufacturing an evaporation source for physical vapor deposition. The evaporation source is formed of the actual sputtering target with an aluminum component and one or more further components as well as of a backing plate made from a material having better thermal conductivity than the target. The backing plate made of a powdery starting material is pressed, together with the powdery components of the sputtering target, into sandwiched powder fractions and then formed.

    Tube target
    6.
    发明专利

    公开(公告)号:AU2006301946A1

    公开(公告)日:2007-04-19

    申请号:AU2006301946

    申请日:2006-10-05

    Applicant: PLANSEE SE

    Abstract: A tubular target formed of molybdenum or a molybdenum alloy has an oxygen content of less than 50 μg/g, a density of greater than 99% of the theoretical density, and an average grain size of less than 100 μm. The molybdenum or molybdenum alloy tube may be produced by extrusion. In one embodiment, the molybdenum tube has a backing tube of titanium or titanium alloy. In an embodiment, the molybdenum tube has a varying wall thickness with an increase towards its ends.

    ИСТОЧНИК ДЛЯ НАНЕСЕНИЯ ПОКРЫТИЯ И СПОСОБ ЕГО ИЗГОТОВЛЕНИЯ

    公开(公告)号:RU2564642C2

    公开(公告)日:2015-10-10

    申请号:RU2012141139

    申请日:2011-04-12

    Applicant: PLANSEE SE

    Abstract: Изобретениеотноситсяк источнику(1) длянанесенияпокрытиякатодно-дуговымосаждениемизпаровойфазыи способуизготовленияисточникадлянанесенияпокрытия. Источник (1) содержитпоменьшеймереодинкомпонент (2, 7), изготовленныйизпоменьшеймереодногопорошкообразногоисходногоматериалапосредствомпорошковойметаллургии, ипоменьшеймереоднуферромагнитнуюобласть (5a, 5b, 6), встроеннуюв компонент (2, 7). Упомянутуюферромагнитнуюобласть (5a, 5b, 6) вводятв компонент (2, 7) инеподвижносоединяютс компонентомвовремяпроцессаизготовленияспособомпорошковойметаллургии. Изобретениепозволяетобеспечитьвысокуюплотностьмагнитногополянаповерхностимишениисточникананесенияпокрытия. 2 н. и 9 з.п. ф-лы, 11 ил.

    8.
    发明专利
    未知

    公开(公告)号:AT491823T

    公开(公告)日:2011-01-15

    申请号:AT06790256

    申请日:2006-10-05

    Applicant: PLANSEE SE

    Abstract: A tubular target formed of molybdenum or a molybdenum alloy has an oxygen content of less than 50 μg/g, a density of greater than 99% of the theoretical density, and an average grain size of less than 100 μm. The molybdenum or molybdenum alloy tube may be produced by extrusion. In one embodiment, the molybdenum tube has a backing tube of titanium or titanium alloy. In an embodiment, the molybdenum tube has a varying wall thickness with an increase towards its ends.

    Tube target
    9.
    发明专利

    公开(公告)号:AU2006301946B2

    公开(公告)日:2010-07-01

    申请号:AU2006301946

    申请日:2006-10-05

    Applicant: PLANSEE SE

    Abstract: A tubular target formed of molybdenum or a molybdenum alloy has an oxygen content of less than 50 μg/g, a density of greater than 99% of the theoretical density, and an average grain size of less than 100 μm. The molybdenum or molybdenum alloy tube may be produced by extrusion. In one embodiment, the molybdenum tube has a backing tube of titanium or titanium alloy. In an embodiment, the molybdenum tube has a varying wall thickness with an increase towards its ends.

    METHOD FOR PRODUCING AN EVAPORATION SOURCE

    公开(公告)号:HU225577B1

    公开(公告)日:2007-03-28

    申请号:HU0301848

    申请日:2001-11-07

    Applicant: PLANSEE SE

    Abstract: The invention relates to a process for manufacturing an evaporation source for physical vapor deposition. The evaporation source is formed of the actual sputtering target with an aluminum component and one or more further components as well as of a backing plate made from a material having better thermal conductivity than the target. The backing plate made of a powdery starting material is pressed, together with the powdery components of the sputtering target, into sandwiched powder fractions and then formed.

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